Reference Type | Journal (article/letter/editorial) |
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Title | Supercapacitive performance of hydrous ruthenium oxide (RuO2·nH2O) thin films deposited by SILAR method |
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Journal | Journal of Materials Science |
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Authors | Deshmukh, P. R. | Author |
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Pusawale, S. N. | Author |
Jagadale, A. D. | Author |
Lokhande, C. D. | Author |
Year | 2012 (February) | Volume | 47 |
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Publisher | Springer Science and Business Media LLC |
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DOI | doi:10.1007/s10853-011-5946-1Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 10010893 | Long-form Identifier | mindat:1:5:10010893:8 |
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GUID | 0 |
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Full Reference | Deshmukh, P. R., Pusawale, S. N., Jagadale, A. D., Lokhande, C. D. (2012) Supercapacitive performance of hydrous ruthenium oxide (RuO2·nH2O) thin films deposited by SILAR method. Journal of Materials Science, 47. 1546-1553 doi:10.1007/s10853-011-5946-1 |
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Plain Text | Deshmukh, P. R., Pusawale, S. N., Jagadale, A. D., Lokhande, C. D. (2012) Supercapacitive performance of hydrous ruthenium oxide (RuO2·nH2O) thin films deposited by SILAR method. Journal of Materials Science, 47. 1546-1553 doi:10.1007/s10853-011-5946-1 |
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In | (n.d.) Journal of Materials Science Vol. 47. Springer Science and Business Media LLC |
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