Shim, C., Yang, J., Quan, Y. C., Choi, J., Jung, D. (2001) Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013100
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition | ||
| Journal | Le Journal de Physique IV | ||
| Authors | Shim, C. | Author | |
| Yang, J. | Author | ||
| Quan, Y. C. | Author | ||
| Choi, J. | Author | ||
| Jung, D. | Author | ||
| Year | 2001 (August) | Volume | 11 |
| Publisher | EDP Sciences | ||
| DOI | doi:10.1051/jp4:20013100Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 10302006 | Long-form Identifier | mindat:1:5:10302006:0 |
| GUID | 0 | ||
| Full Reference | Shim, C., Yang, J., Quan, Y. C., Choi, J., Jung, D. (2001) Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013100 | ||
| Plain Text | Shim, C., Yang, J., Quan, Y. C., Choi, J., Jung, D. (2001) Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013100 | ||
| In | (n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences | ||
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