Kumar, S.V.K., Murali, Megha, Kushwaha, Preksha (2015) Comparison of the effect of NaOH and TE buffer on 25 to 100 eV electron induced damage to ΦX174 dsDNA. The European Physical Journal D, 69. doi:10.1140/epjd/e2015-60203-8
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Comparison of the effect of NaOH and TE buffer on 25 to 100 eV electron induced damage to ΦX174 dsDNA | ||
| Journal | The European Physical Journal D | ||
| Authors | Kumar, S.V.K. | Author | |
| Murali, Megha | Author | ||
| Kushwaha, Preksha | Author | ||
| Year | 2015 (September) | Volume | 69 |
| Publisher | Springer Science and Business Media LLC | ||
| DOI | doi:10.1140/epjd/e2015-60203-8Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 10361439 | Long-form Identifier | mindat:1:5:10361439:9 |
| GUID | 0 | ||
| Full Reference | Kumar, S.V.K., Murali, Megha, Kushwaha, Preksha (2015) Comparison of the effect of NaOH and TE buffer on 25 to 100 eV electron induced damage to ΦX174 dsDNA. The European Physical Journal D, 69. doi:10.1140/epjd/e2015-60203-8 | ||
| Plain Text | Kumar, S.V.K., Murali, Megha, Kushwaha, Preksha (2015) Comparison of the effect of NaOH and TE buffer on 25 to 100 eV electron induced damage to ΦX174 dsDNA. The European Physical Journal D, 69. doi:10.1140/epjd/e2015-60203-8 | ||
| In | (n.d.) The European Physical Journal D Vol. 69. Springer Science and Business Media LLC | ||
See Also
These are possibly similar items as determined by title/reference text matching only.
