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Ryu, S.-W., Hong, J.-S., Kim, S.-T., Yang, J.-Y., Ahn, B.-C., Hong, W.-P., Park, S.-H., Kim, H.-M., Kim, J.-J. (2007) Properties of In2O3-SnO2 Thin Films Due to the Cathode Condition in the DC Magnetron Sputtering Process. Journal of the Korean Physical Society, 50 (6). 1833pp. doi:10.3938/jkps.50.1833

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Reference TypeJournal (article/letter/editorial)
TitleProperties of In2O3-SnO2 Thin Films Due to the Cathode Condition in the DC Magnetron Sputtering Process
JournalJournal of the Korean Physical Society
AuthorsRyu, S.-W.Author
Hong, J.-S.Author
Kim, S.-T.Author
Yang, J.-Y.Author
Ahn, B.-C.Author
Hong, W.-P.Author
Park, S.-H.Author
Kim, H.-M.Author
Kim, J.-J.Author
Year2007 (June 15)Volume50
Issue6
PublisherKorean Physical Society
DOIdoi:10.3938/jkps.50.1833Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID11231320Long-form Identifiermindat:1:5:11231320:7
GUID0
Full ReferenceRyu, S.-W., Hong, J.-S., Kim, S.-T., Yang, J.-Y., Ahn, B.-C., Hong, W.-P., Park, S.-H., Kim, H.-M., Kim, J.-J. (2007) Properties of In2O3-SnO2 Thin Films Due to the Cathode Condition in the DC Magnetron Sputtering Process. Journal of the Korean Physical Society, 50 (6). 1833pp. doi:10.3938/jkps.50.1833
Plain TextRyu, S.-W., Hong, J.-S., Kim, S.-T., Yang, J.-Y., Ahn, B.-C., Hong, W.-P., Park, S.-H., Kim, H.-M., Kim, J.-J. (2007) Properties of In2O3-SnO2 Thin Films Due to the Cathode Condition in the DC Magnetron Sputtering Process. Journal of the Korean Physical Society, 50 (6). 1833pp. doi:10.3938/jkps.50.1833
In(2007, June) Journal of the Korean Physical Society Vol. 50 (6) Korean Physical Society

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