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Mateev, Maria, Lautenschläger, Thomas, Spemann, Daniel, Finzel, Annemarie, Gerlach, Jürgen W., Frost, Frank, Bundesmann, Carsten (2018) Systematic investigation of the reactive ion beam sputter deposition process of SiO2. The European Physical Journal B, 91 (2). doi:10.1140/epjb/e2018-80453-x

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Reference TypeJournal (article/letter/editorial)
TitleSystematic investigation of the reactive ion beam sputter deposition process of SiO2
JournalThe European Physical Journal B
AuthorsMateev, MariaAuthor
Lautenschläger, ThomasAuthor
Spemann, DanielAuthor
Finzel, AnnemarieAuthor
Gerlach, Jürgen W.Author
Frost, FrankAuthor
Bundesmann, CarstenAuthor
Year2018 (February)Volume91
Issue2
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1140/epjb/e2018-80453-xSearch in ResearchGate
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Mindat Ref. ID11285989Long-form Identifiermindat:1:5:11285989:7
GUID0
Full ReferenceMateev, Maria, Lautenschläger, Thomas, Spemann, Daniel, Finzel, Annemarie, Gerlach, Jürgen W., Frost, Frank, Bundesmann, Carsten (2018) Systematic investigation of the reactive ion beam sputter deposition process of SiO2. The European Physical Journal B, 91 (2). doi:10.1140/epjb/e2018-80453-x
Plain TextMateev, Maria, Lautenschläger, Thomas, Spemann, Daniel, Finzel, Annemarie, Gerlach, Jürgen W., Frost, Frank, Bundesmann, Carsten (2018) Systematic investigation of the reactive ion beam sputter deposition process of SiO2. The European Physical Journal B, 91 (2). doi:10.1140/epjb/e2018-80453-x
In(2018, February) The European Physical Journal B Vol. 91 (2) Springer Science and Business Media LLC

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Pietzonka, Lukas, Lautenschläger, Thomas, Spemann, Daniel, Finzel, Annemarie, Gerlach, Jürgen W., Frost, Frank, Bundesmann, Carsten (2018) Ion beam sputter deposition of TiO2 films using oxygen ions. The European Physical Journal B, 91 (10). doi:10.1140/epjb/e2018-90293-3
Bundesmann, Carsten, Lautenschläge, Thomas, Spemann, Daniel, Finzel, Annemarie, Mensing, Michael, Frost, Frank (2017) Correlation of process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target. The European Physical Journal B, 90 (10). doi:10.1140/epjb/e2017-80326-x
Bernstein, Jacques, Gerlach, Jürgen W., Finzel, Annemarie, Bundesmann, Carsten (2022) Ion beam sputter deposition of $$\hbox {SiO}_2$$ thin films using oxygen ions. The European Physical Journal B, 95 (3) doi:10.1140/epjb/s10051-022-00307-y
Bundesmann, C., Lautenschläger, T., Spemann, D., Finzel, A., Thelander, E., Mensing, M., Frost, F. (2017) Systematic investigation of the properties of TiO2 films grown by reactive ion beam sputter deposition. Applied Surface Science, 421. 331-340 doi:10.1016/j.apsusc.2016.08.056
Bundesmann, C., Lautenschläger, T., Thelander, E., Spemann, D. (2017) Reactive Ar ion beam sputter deposition of TiO2 films: Influence of process parameters on film properties. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 395. 17-23 doi:10.1016/j.nimb.2017.01.078
Kalanov, Dmitry, Gerlach, Jürgen W., Bundesmann, Carsten, Bauer, Jens, Lotnyk, Andriy, von Wenckstern, Holger, Anders, André, Unutulmazsoy, Yeliz (2024) Heteroepitaxial growth of Ga2O3 thin films on Al2O3(0001) by ion beam sputter deposition. Journal of Applied Physics, 136 (1) doi:10.1063/5.0211179
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