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Chen, J.T., Wang, J., Zhang, F., Zhang, G.A., Fan, X.Y., Wu, Z.G., Yan, P.X. (2009) Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering. Journal of Alloys and Compounds, 472. 91-96 doi:10.1016/j.jallcom.2008.04.083

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering
JournalJournal of Alloys and Compounds
AuthorsChen, J.T.Author
Wang, J.Author
Zhang, F.Author
Zhang, G.A.Author
Fan, X.Y.Author
Wu, Z.G.Author
Yan, P.X.Author
Year2009 (March)Volume472
PublisherElsevier BV
DOIdoi:10.1016/j.jallcom.2008.04.083Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID11892020Long-form Identifiermindat:1:5:11892020:1
GUID0
Full ReferenceChen, J.T., Wang, J., Zhang, F., Zhang, G.A., Fan, X.Y., Wu, Z.G., Yan, P.X. (2009) Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering. Journal of Alloys and Compounds, 472. 91-96 doi:10.1016/j.jallcom.2008.04.083
Plain TextChen, J.T., Wang, J., Zhang, F., Zhang, G.A., Fan, X.Y., Wu, Z.G., Yan, P.X. (2009) Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering. Journal of Alloys and Compounds, 472. 91-96 doi:10.1016/j.jallcom.2008.04.083
In(n.d.) Journal of Alloys and Compounds Vol. 472. Elsevier BV

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