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Zheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo, Gooding, J. Justin (2016) Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly. Advanced Materials, 28. 2330-2336 doi:10.1002/adma.201505022

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Reference TypeJournal (article/letter/editorial)
TitleUnclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly
JournalAdvanced Materials
AuthorsZheng, YuanhuiAuthor
Jiang, ChengAuthor
Ng, Soon HockAuthor
Lu, YongAuthor
Han, FeiAuthor
Bach, UdoAuthor
Gooding, J. JustinAuthor
Year2016 (March)Volume28
PublisherWiley
DOIdoi:10.1002/adma.201505022Search in ResearchGate
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Mindat Ref. ID12501097Long-form Identifiermindat:1:5:12501097:1
GUID0
Full ReferenceZheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo, Gooding, J. Justin (2016) Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly. Advanced Materials, 28. 2330-2336 doi:10.1002/adma.201505022
Plain TextZheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo, Gooding, J. Justin (2016) Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly. Advanced Materials, 28. 2330-2336 doi:10.1002/adma.201505022
In(2016) Advanced Materials Vol. 28. Wiley


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