Zheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo, Gooding, J. Justin (2016) Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly. Advanced Materials, 28. 2330-2336 doi:10.1002/adma.201505022
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly | ||
Journal | Advanced Materials | ||
Authors | Zheng, Yuanhui | Author | |
Jiang, Cheng | Author | ||
Ng, Soon Hock | Author | ||
Lu, Yong | Author | ||
Han, Fei | Author | ||
Bach, Udo | Author | ||
Gooding, J. Justin | Author | ||
Year | 2016 (March) | Volume | 28 |
Publisher | Wiley | ||
DOI | doi:10.1002/adma.201505022Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 12501097 | Long-form Identifier | mindat:1:5:12501097:1 |
GUID | 0 | ||
Full Reference | Zheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo, Gooding, J. Justin (2016) Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly. Advanced Materials, 28. 2330-2336 doi:10.1002/adma.201505022 | ||
Plain Text | Zheng, Yuanhui, Jiang, Cheng, Ng, Soon Hock, Lu, Yong, Han, Fei, Bach, Udo, Gooding, J. Justin (2016) Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly. Advanced Materials, 28. 2330-2336 doi:10.1002/adma.201505022 | ||
In | (2016) Advanced Materials Vol. 28. Wiley |
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