Raauf, Aida, Leduc, Jennifer, Frank, Michael, Stadler, Daniel, Graf, David, Wilhelm, Michael, Grosch, Matthias, Mathur, Sanjay (2021) Magnetic Field-Assisted Chemical Vapor Deposition of UO2 Thin Films. Inorganic Chemistry, 60 (3) 1915-1921 doi:10.1021/acs.inorgchem.0c03387
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Magnetic Field-Assisted Chemical Vapor Deposition of UO2 Thin Films | ||
Journal | Inorganic Chemistry | ||
Authors | Raauf, Aida | Author | |
Leduc, Jennifer | Author | ||
Frank, Michael | Author | ||
Stadler, Daniel | Author | ||
Graf, David | Author | ||
Wilhelm, Michael | Author | ||
Grosch, Matthias | Author | ||
Mathur, Sanjay | Author | ||
Year | 2021 (February 1) | Volume | 60 |
Issue | 3 | ||
Publisher | American Chemical Society (ACS) | ||
DOI | doi:10.1021/acs.inorgchem.0c03387Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 13426709 | Long-form Identifier | mindat:1:5:13426709:0 |
GUID | 0 | ||
Full Reference | Raauf, Aida, Leduc, Jennifer, Frank, Michael, Stadler, Daniel, Graf, David, Wilhelm, Michael, Grosch, Matthias, Mathur, Sanjay (2021) Magnetic Field-Assisted Chemical Vapor Deposition of UO2 Thin Films. Inorganic Chemistry, 60 (3) 1915-1921 doi:10.1021/acs.inorgchem.0c03387 | ||
Plain Text | Raauf, Aida, Leduc, Jennifer, Frank, Michael, Stadler, Daniel, Graf, David, Wilhelm, Michael, Grosch, Matthias, Mathur, Sanjay (2021) Magnetic Field-Assisted Chemical Vapor Deposition of UO2 Thin Films. Inorganic Chemistry, 60 (3) 1915-1921 doi:10.1021/acs.inorgchem.0c03387 | ||
In | (2021, February) Inorganic Chemistry Vol. 60 (3) American Chemical Society (ACS) |
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