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(2011) Effect of oxygen flow rate and radio-frequency power on the photoconductivity of highly ultraviolet sensitive ZnO thin films grown by magnetron sputtering. Materials Research Bulletin, 46 (11) 1975-1979 doi:10.1016/j.materresbull.2011.07.019

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Reference TypeJournal (article/letter/editorial)
TitleEffect of oxygen flow rate and radio-frequency power on the photoconductivity of highly ultraviolet sensitive ZnO thin films grown by magnetron sputtering
JournalMaterials Research Bulletin
Year2011 (November)Volume46
Issue11
PublisherElsevier BV
DOIdoi:10.1016/j.materresbull.2011.07.019Search in ResearchGate
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Mindat Ref. ID13486588Long-form Identifiermindat:1:5:13486588:3
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Full Reference(2011) Effect of oxygen flow rate and radio-frequency power on the photoconductivity of highly ultraviolet sensitive ZnO thin films grown by magnetron sputtering. Materials Research Bulletin, 46 (11) 1975-1979 doi:10.1016/j.materresbull.2011.07.019
Plain Text(2011) Effect of oxygen flow rate and radio-frequency power on the photoconductivity of highly ultraviolet sensitive ZnO thin films grown by magnetron sputtering. Materials Research Bulletin, 46 (11) 1975-1979 doi:10.1016/j.materresbull.2011.07.019
In(2011, November) Materials Research Bulletin Vol. 46 (11) Elsevier BV

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