Reference Type | Journal (article/letter/editorial) |
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Title | Mechanism for generating interstitial atoms by thermal stress during silicon crystal growth |
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Journal | Progress in Crystal Growth and Characterization of Materials |
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Authors | Abe, Takao | Author |
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Takahashi, Toru | Author |
Shirai, Koun | Author |
Year | 2019 (February) | Volume | 65 |
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Issue | 1 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/j.pcrysgrow.2019.01.001Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 13522035 | Long-form Identifier | mindat:1:5:13522035:3 |
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GUID | 0 |
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Full Reference | Abe, Takao, Takahashi, Toru, Shirai, Koun (2019) Mechanism for generating interstitial atoms by thermal stress during silicon crystal growth. Progress in Crystal Growth and Characterization of Materials, 65 (1) 36-46 doi:10.1016/j.pcrysgrow.2019.01.001 |
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Plain Text | Abe, Takao, Takahashi, Toru, Shirai, Koun (2019) Mechanism for generating interstitial atoms by thermal stress during silicon crystal growth. Progress in Crystal Growth and Characterization of Materials, 65 (1) 36-46 doi:10.1016/j.pcrysgrow.2019.01.001 |
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In | (2019, February) Progress in Crystal Growth and Characterization of Materials Vol. 65 (1) Elsevier BV |
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