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Harrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2006) Prediction of the anomalous fluorine-silicon interstitial pair diffusion in crystalline silicon. Physical Review B, 74 (12) doi:10.1103/physrevb.74.121201

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Reference TypeJournal (article/letter/editorial)
TitlePrediction of the anomalous fluorine-silicon interstitial pair diffusion in crystalline silicon
JournalPhysical Review B
AuthorsHarrison, Scott A.Author
Edgar, Thomas F.Author
Hwang, Gyeong S.Author
Year2006 (September 6)Volume74
Issue12
PublisherAmerican Physical Society (APS)
DOIdoi:10.1103/physrevb.74.121201Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14185616Long-form Identifiermindat:1:5:14185616:4
GUID0
Full ReferenceHarrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2006) Prediction of the anomalous fluorine-silicon interstitial pair diffusion in crystalline silicon. Physical Review B, 74 (12) doi:10.1103/physrevb.74.121201
Plain TextHarrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2006) Prediction of the anomalous fluorine-silicon interstitial pair diffusion in crystalline silicon. Physical Review B, 74 (12) doi:10.1103/physrevb.74.121201
In(2006, September) Physical Review B Vol. 74 (12) American Physical Society (APS)

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Harrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2006) Interstitial-mediated mechanisms of As and P diffusion in Si: Gradient-corrected density-functional calculations. Physical Review B, 74 (19) doi:10.1103/physrevb.74.195202
Harrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2005) Structure and dynamics of the diarsenic complex in crystalline silicon. Physical Review B, 72 (19) doi:10.1103/physrevb.72.195414
Harrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2005) Structure, stability, and diffusion of arsenic-silicon interstitial pairs. Applied Physics Letters, 87 (23). 231905pp. doi:10.1063/1.2130398
Harrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2004) Interaction between interstitials and arsenic-vacancy complexes in crystalline silicon. Applied Physics Letters, 85 (21). 4935-4937 doi:10.1063/1.1825616
Hwang, Gyeong S., Goddard, William A. (2002) Diffusion and dissociation of neutral divacancies in crystalline silicon. Physical Review B, 65 (23) doi:10.1103/physrevb.65.233205
Lee, Sangheon, Hwang, Gyeong S. (2008) Structure and stability of small compact self-interstitial clusters in crystalline silicon. Physical Review B, 77 (8) doi:10.1103/physrevb.77.085210
Harrison, Scott A., Edgar, Thomas F., Hwang, Gyeong S. (2007) Prediction of B–Sii–F complex formation and its role in B transient enhanced diffusion suppression and deactivation. Journal of Applied Physics, 101 (6). 66102pp. doi:10.1063/1.2710432
Hwang, Gyeong S., Goddard, William A. (2002) Diffusion of the Diboron Pair in Silicon. Physical Review Letters, 89 (5). doi:10.1103/physrevlett.89.055901
Bondi, Robert J., Lee, Sangheon, Hwang, Gyeong S. (2009) Theoretical characterization of silicon self-interstitial clusters in uniform strain fields. Physical Review B, 80 (12) doi:10.1103/physrevb.80.125202
Lee, Sangheon, Hwang, Gyeong S. (2008) Growth and shape transition of small silicon self-interstitial clusters. Physical Review B, 78 (4) doi:10.1103/physrevb.78.045204
Harrison, Scott A., Yu, Decai, Edgar, Thomas F., Hwang, Gyeong S., Kirichenko, Taras A., Banerjee, Sanjay K. (2004) Origin of vacancy and interstitial stabilization at the amorphous-crystalline Si interface. Journal of Applied Physics, 96 (6). 3334-3338 doi:10.1063/1.1778475
 
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