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Vanhove, N., Lievens, P., Vandervorst, W. (2009) Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry. Physical Review B, 79 (3) doi:10.1103/physrevb.79.035305

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Reference TypeJournal (article/letter/editorial)
TitleParticle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry
JournalPhysical Review B
AuthorsVanhove, N.Author
Lievens, P.Author
Vandervorst, W.Author
Year2009 (January 6)Volume79
Issue3
PublisherAmerican Physical Society (APS)
DOIdoi:10.1103/physrevb.79.035305Search in ResearchGate
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Mindat Ref. ID14202355Long-form Identifiermindat:1:5:14202355:8
GUID0
Full ReferenceVanhove, N., Lievens, P., Vandervorst, W. (2009) Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry. Physical Review B, 79 (3) doi:10.1103/physrevb.79.035305
Plain TextVanhove, N., Lievens, P., Vandervorst, W. (2009) Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry. Physical Review B, 79 (3) doi:10.1103/physrevb.79.035305
In(2009, January) Physical Review B Vol. 79 (3) American Physical Society (APS)

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Vanhove, N., Lievens, P., Vandervorst, W. (2011) Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2-based etching. Surface and Interface Analysis, 43 (1). 159-162 doi:10.1002/sia.3616
Dawson, P. H. (1977) Oxygen adsorption on molybdenum studied by low-energy secondary-ion mass spectrometry and electron-induced desorption. Physical Review B, 15 (12) 5522-5534 doi:10.1103/physrevb.15.5522
Walton, S. G., Peko, B. L., Champion, R. L. (1998) Photon-induced anion emission: A mechanism for ion-induced secondary-electron emission from an Al/O surface. Physical Review B, 58 (23) 15430-15432 doi:10.1103/physrevb.58.15430
Lauderback, L. L., Delgass, W. N. (1982) Intact emission of CO in secondary-ion mass spectrometry of CO-covered Ru(001) Physical Review B, 26 (9) 5258-5260 doi:10.1103/physrevb.26.5258
Bastiaansen, J., Philipsen, V., Vervaecke, F., Vandeweert, E., Lievens, P., Silverans, R. E. (2003) Velocity dependent electron transfer during emission of ion-beam sputtered Cu atoms. Physical Review B, 68 (7) doi:10.1103/physrevb.68.073409
Cazaux, J., Bozhko, Y., Hilleret, N. (2005) Electron-induced secondary electron emission yield from condensed rare gases: Ne, Ar, Kr, and Xe. Physical Review B, 71 (3) doi:10.1103/physrevb.71.035419
Bernhard, T., Winter, H. (2009) Electron emission induced by grazing impact ofH+andHe+ions on a Cu(001) surface: Low-energy electron diffraction study. Physical Review B, 79 (3) doi:10.1103/physrevb.79.033411
Yamamoto, N., Araya, K., García de Abajo, F. J. (2001) Photon emission from silver particles induced by a high-energy electron beam. Physical Review B, 64 (20) doi:10.1103/physrevb.64.205419
Best, P. E. (1979) Electronic structure of Si(111)-Cl by angle-resolved secondary emission and electron energy loss. Physical Review B, 19 (2) 1054-1059 doi:10.1103/physrevb.19.1054
Vanhove, N., Lievens, P., Vandervorst, W. (2008) Towards quantitative depth profiling with high spatial and high depth resolution. Applied Surface Science, 255. 1360-1363 doi:10.1016/j.apsusc.2008.05.178
Lee, Wei-Chiang, Hwang, J. (2008) Secondary ion emission enhancement assisted by electron beam in secondary ion mass spectrometry. International Journal of Mass Spectrometry, 274 (1). 25-29 doi:10.1016/j.ijms.2008.04.016
 
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