| Reference Type | Journal (article/letter/editorial) |
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| Title | Fabrication of SiO2Grating Patterns with Vertical Sidewalls by SOR X-Ray Lithography and Reactive Ion-Beam Etching |
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| Journal | Japanese Journal of Applied Physics |
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| Authors | Matsui, Shinji | Author |
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| Moriwaki, Kazuyuki | Author |
| Masuda, Noboru | Author |
| Nakamura, Takehiro | Author |
| Aritome, Hiroaki | Author |
| Namba, Susumu | Author |
| Year | 1981 (September) | Volume | 20 |
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| Issue | 9 |
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| Publisher | Japan Society of Applied Physics |
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| DOI | doi:10.1143/jjap.20.1735Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 14985211 | Long-form Identifier | mindat:1:5:14985211:3 |
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|
| GUID | 0 |
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| Full Reference | Matsui, Shinji, Moriwaki, Kazuyuki, Masuda, Noboru, Nakamura, Takehiro, Aritome, Hiroaki, Namba, Susumu (1981) Fabrication of SiO2Grating Patterns with Vertical Sidewalls by SOR X-Ray Lithography and Reactive Ion-Beam Etching. Japanese Journal of Applied Physics, 20 (9) 1735-1740 doi:10.1143/jjap.20.1735 |
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| Plain Text | Matsui, Shinji, Moriwaki, Kazuyuki, Masuda, Noboru, Nakamura, Takehiro, Aritome, Hiroaki, Namba, Susumu (1981) Fabrication of SiO2Grating Patterns with Vertical Sidewalls by SOR X-Ray Lithography and Reactive Ion-Beam Etching. Japanese Journal of Applied Physics, 20 (9) 1735-1740 doi:10.1143/jjap.20.1735 |
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| In | (1981, September) Japanese Journal of Applied Physics Vol. 20 (9) Japan Society of Applied Physics |
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