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Rar, Andrei, Yoshitake, Michiko (2000) Reduction and Removal of Thin Al Oxide Film from Cu Substrate by Focused Electron Beam. Japanese Journal of Applied Physics, 39. 4464-4468 doi:10.1143/jjap.39.4464

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Reference TypeJournal (article/letter/editorial)
TitleReduction and Removal of Thin Al Oxide Film from Cu Substrate by Focused Electron Beam
JournalJapanese Journal of Applied Physics
AuthorsRar, AndreiAuthor
Yoshitake, MichikoAuthor
Year2000 (July 30)Volume39
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.39.4464Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15014259Long-form Identifiermindat:1:5:15014259:3
GUID0
Full ReferenceRar, Andrei, Yoshitake, Michiko (2000) Reduction and Removal of Thin Al Oxide Film from Cu Substrate by Focused Electron Beam. Japanese Journal of Applied Physics, 39. 4464-4468 doi:10.1143/jjap.39.4464
Plain TextRar, Andrei, Yoshitake, Michiko (2000) Reduction and Removal of Thin Al Oxide Film from Cu Substrate by Focused Electron Beam. Japanese Journal of Applied Physics, 39. 4464-4468 doi:10.1143/jjap.39.4464
In(2000) Japanese Journal of Applied Physics Vol. 39. Japan Society of Applied Physics

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Yamauchi, Yasuhiro, Yoshitake, Michiko, Song, Weijie (2003) Morphology and Thickness of Ultra-Thin Epitaxial Al2O3Film on Cu-9%Al(111) Japanese Journal of Applied Physics, 42. 4721-4724 doi:10.1143/jjap.42.4721
Yarrama Reddy, Aparna, Yoshitake, Michiko, Yoshihara, Kazuhiro (2000) Work Function and Surface Segregation Study on Nb/Ti/Cu Multilayer Films. Japanese Journal of Applied Physics, 39. 4447-4450 doi:10.1143/jjap.39.4447
Song, Weijie, Yoshitake, Michiko, Bera, Santanu, Yamauchi, Yasuhiro (2003) Oxygen Adsorption and Oxide Formation on Cu-9%Al(111) Surface Studied Using Low Energy Electron Diffraction and X-ray Photoelectron Spectroscopy. Japanese Journal of Applied Physics, 42. 4716-4720 doi:10.1143/jjap.42.4716
Kuroda, Kenichi, Mukaida, Masashi, Yamamoto, Masafumi, Miyazawa, Shintaro (1988) Preparation of New High-TcSuperconducting Oxide Bi-Sr-Ca-Cu-O Thin Film by Electron Beam Deposition Technique. Japanese Journal of Applied Physics, 27. doi:10.1143/jjap.27.l625
Yoshitake, Masaaki, Yotsuya, Tsutom, Takiguchi, Katsumi, Ogawa, Soichi (1993) Synthesis of Zr-N Thin Film by Reactive Ion Beam Sputtering. Japanese Journal of Applied Physics, 32. 1031 doi:10.1143/jjap.32.1031
Hino, Taro (2000) Vanishing of Resistance and Diamagnetism Observed in a Very Thin Al Film at Room Temperature. Japanese Journal of Applied Physics, 39. doi:10.1143/jjap.39.l426
Komano, Haruki, Ogawa, Youji, Takigawa, Tadahiro (1990) Silicon Oxide Film Formation by Focused Ion Beam (FIB)-Assisted Deposition. Japanese Journal of Applied Physics, 29. 219 doi:10.1143/jjap.29.219c
Yoshitake, Masaaki, Yotsuya, Tsutom, Takiguchi, Katsumi, Ogawa, Soichi (1990) Synthesis of Zr–N Thin Film by Reactive Ion Beam Sputtering. Japanese Journal of Applied Physics, 29. 2800-2808 doi:10.1143/jjap.29.2800
Nakagawa, Yoshiro, Kawauchi, Hiroshi (2000) Removal of NOxin Oxygen-Mixed NO(=200 ppm)/N2Gas by Pulsed Electron Beam Irradiation. Japanese Journal of Applied Physics, 39. 4231-4235 doi:10.1143/jjap.39.4231
Shimizu, Youichi, Yamashita, Tohru, Takase, Satoko (2000) Electrochromic Phosphate-Ion Sensor Based on Nickel-Oxide Thin-Film Electrode. Japanese Journal of Applied Physics, 39. doi:10.1143/jjap.39.l384
Miyake, Aki, Kominami, Hiroko, Tatsuoka, Hirokazu, Kuwabara, Hiroshi, Nakanishi, Yoichiro, Hatanaka, Yoshinori (2000) Growth of Epitaxial ZnO Thin Film by Oxidation of Epitaxial ZnS Film on Si(111) Substrate. Japanese Journal of Applied Physics, 39. doi:10.1143/jjap.39.l1186
 
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