| Reference Type | Journal (article/letter/editorial) |
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| Title | Mechanism of Growth of Cr$_{2}$O$_{3}$ Thin Films on ($1\bar{1}02$), ($11\bar{2}0$), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering |
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| Journal | Japanese Journal of Applied Physics |
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| Authors | Iwata, Nobuyuki | Author |
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| Kuroda, Takuji | Author |
| Yamamoto, Hiroshi | Author |
| Year | 2012 (November 20) | Volume | 51 |
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| Publisher | Japan Society of Applied Physics |
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| DOI | doi:10.1143/jjap.51.11pg12Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 15041312 | Long-form Identifier | mindat:1:5:15041312:9 |
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|
| GUID | 0 |
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| Full Reference | Iwata, Nobuyuki, Kuroda, Takuji, Yamamoto, Hiroshi (2012) Mechanism of Growth of Cr$_{2}$O$_{3}$ Thin Films on ($1\bar{1}02$), ($11\bar{2}0$), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering. Japanese Journal of Applied Physics, 51. 11 doi:10.1143/jjap.51.11pg12 |
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| Plain Text | Iwata, Nobuyuki, Kuroda, Takuji, Yamamoto, Hiroshi (2012) Mechanism of Growth of Cr$_{2}$O$_{3}$ Thin Films on ($1\bar{1}02$), ($11\bar{2}0$), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering. Japanese Journal of Applied Physics, 51. 11 doi:10.1143/jjap.51.11pg12 |
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| In | (2012) Japanese Journal of Applied Physics Vol. 51. Japan Society of Applied Physics |
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