Kusumandari, Kusumandari, Takeuchi, Wakana, Kato, Kimihiko, Shibayama, Shigehisa, Sakashita, Mitsuo, Nakatsuka, Osamu, Zaima, Shigeaki (2012) Characterization of Damage of Al$_{2}$O$_{3}$/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01aj01
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Characterization of Damage of Al$_{2}$O$_{3}$/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Kusumandari, Kusumandari | Author | |
| Takeuchi, Wakana | Author | ||
| Kato, Kimihiko | Author | ||
| Shibayama, Shigehisa | Author | ||
| Sakashita, Mitsuo | Author | ||
| Nakatsuka, Osamu | Author | ||
| Zaima, Shigeaki | Author | ||
| Year | 2012 (January 20) | Volume | 51 |
| Issue | 1 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.51.01aj01Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15041500 | Long-form Identifier | mindat:1:5:15041500:0 |
| GUID | 0 | ||
| Full Reference | Kusumandari, Kusumandari, Takeuchi, Wakana, Kato, Kimihiko, Shibayama, Shigehisa, Sakashita, Mitsuo, Nakatsuka, Osamu, Zaima, Shigeaki (2012) Characterization of Damage of Al$_{2}$O$_{3}$/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01aj01 | ||
| Plain Text | Kusumandari, Kusumandari, Takeuchi, Wakana, Kato, Kimihiko, Shibayama, Shigehisa, Sakashita, Mitsuo, Nakatsuka, Osamu, Zaima, Shigeaki (2012) Characterization of Damage of Al$_{2}$O$_{3}$/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.1143/jjap.51.01aj01 | ||
| In | (2012, January) Japanese Journal of Applied Physics Vol. 51 (1) Japan Society of Applied Physics | ||
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