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Ito, Haruhiko, Kumakura, Motoki, Suzuki, Tsuneo, Niibe, Masahito, Kanda, Kazuhiro, Saitoh, Hidetoshi (2016) Fabrication of hydrogenated amorphous silicon carbide films by decomposition of hexamethyldisilane with microwave discharge flow of Ar. Japanese Journal of Applied Physics, 55 (6) 6 doi:10.7567/jjap.55.06hc01

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Reference TypeJournal (article/letter/editorial)
TitleFabrication of hydrogenated amorphous silicon carbide films by decomposition of hexamethyldisilane with microwave discharge flow of Ar
JournalJapanese Journal of Applied Physics
AuthorsIto, HaruhikoAuthor
Kumakura, MotokiAuthor
Suzuki, TsuneoAuthor
Niibe, MasahitoAuthor
Kanda, KazuhiroAuthor
Saitoh, HidetoshiAuthor
Year2016 (June 1)Volume55
Issue6
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.55.06hc01Search in ResearchGate
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Mindat Ref. ID15046539Long-form Identifiermindat:1:5:15046539:5
GUID0
Full ReferenceIto, Haruhiko, Kumakura, Motoki, Suzuki, Tsuneo, Niibe, Masahito, Kanda, Kazuhiro, Saitoh, Hidetoshi (2016) Fabrication of hydrogenated amorphous silicon carbide films by decomposition of hexamethyldisilane with microwave discharge flow of Ar. Japanese Journal of Applied Physics, 55 (6) 6 doi:10.7567/jjap.55.06hc01
Plain TextIto, Haruhiko, Kumakura, Motoki, Suzuki, Tsuneo, Niibe, Masahito, Kanda, Kazuhiro, Saitoh, Hidetoshi (2016) Fabrication of hydrogenated amorphous silicon carbide films by decomposition of hexamethyldisilane with microwave discharge flow of Ar. Japanese Journal of Applied Physics, 55 (6) 6 doi:10.7567/jjap.55.06hc01
In(2016, June) Japanese Journal of Applied Physics Vol. 55 (6) Japan Society of Applied Physics


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