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Dong, Bangyan, Zhan, Shunda, Lu, Jiajun, Chen, Zhaojie, Zhao, Yonghua (2023) Phenomena and mechanism of local oxidation microlithography of 4H–SiC via electrochemical jet anodisation. Ceramics International, 49 (6) 8781-8792 doi:10.1016/j.ceramint.2022.11.029

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Reference TypeJournal (article/letter/editorial)
TitlePhenomena and mechanism of local oxidation microlithography of 4H–SiC via electrochemical jet anodisation
JournalCeramics International
AuthorsDong, BangyanAuthor
Zhan, ShundaAuthor
Lu, JiajunAuthor
Chen, ZhaojieAuthor
Zhao, YonghuaAuthor
Year2023 (March)Volume49
Issue6
PublisherElsevier BV
DOIdoi:10.1016/j.ceramint.2022.11.029Search in ResearchGate
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Mindat Ref. ID15702990Long-form Identifiermindat:1:5:15702990:3
GUID0
Full ReferenceDong, Bangyan, Zhan, Shunda, Lu, Jiajun, Chen, Zhaojie, Zhao, Yonghua (2023) Phenomena and mechanism of local oxidation microlithography of 4H–SiC via electrochemical jet anodisation. Ceramics International, 49 (6) 8781-8792 doi:10.1016/j.ceramint.2022.11.029
Plain TextDong, Bangyan, Zhan, Shunda, Lu, Jiajun, Chen, Zhaojie, Zhao, Yonghua (2023) Phenomena and mechanism of local oxidation microlithography of 4H–SiC via electrochemical jet anodisation. Ceramics International, 49 (6) 8781-8792 doi:10.1016/j.ceramint.2022.11.029
In(2023, March) Ceramics International Vol. 49 (6) Elsevier BV

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