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Teyssandier, F., Ducarroir, M., Bernard, C. (1984) On the theoretical conditions of chemical deposition of refractory solid solutions: titanium carbonitride. Journal of Materials Science Letters, 3 (4) 355-358 doi:10.1007/bf00729396

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Reference TypeJournal (article/letter/editorial)
TitleOn the theoretical conditions of chemical deposition of refractory solid solutions: titanium carbonitride
JournalJournal of Materials Science Letters
AuthorsTeyssandier, F.Author
Ducarroir, M.Author
Bernard, C.Author
Year1984 (April)Volume3
Issue4
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/bf00729396Search in ResearchGate
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Mindat Ref. ID16408869Long-form Identifiermindat:1:5:16408869:6
GUID0
Full ReferenceTeyssandier, F., Ducarroir, M., Bernard, C. (1984) On the theoretical conditions of chemical deposition of refractory solid solutions: titanium carbonitride. Journal of Materials Science Letters, 3 (4) 355-358 doi:10.1007/bf00729396
Plain TextTeyssandier, F., Ducarroir, M., Bernard, C. (1984) On the theoretical conditions of chemical deposition of refractory solid solutions: titanium carbonitride. Journal of Materials Science Letters, 3 (4) 355-358 doi:10.1007/bf00729396
In(1984, April) Journal of Materials Science Letters Vol. 3 (4) Springer Science and Business Media LLC

See Also

These are possibly similar items as determined by title/reference text matching only.

Touanen, M., Teyssandier, F., Ducarroir, M. (1989) Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H. Journal of Materials Science Letters, 8 (1) 98-101 doi:10.1007/bf00720264
Teyssandier, F., Ducarroir, M., Bernard, C. (1984) Thermodynamic study of the titanium-carbon-nitrogen phase diagram at high temperature. Calphad, 8 (3) 233-242 doi:10.1016/0364-5916(84)90015-4
Teyssandier, F., Bernard, C., Ducarroir, M. (1988) Thermodynamic and experimental study of CVD of non-stoichiometric titanium nitride from TiCl4N2-H2 mixtures. Journal of Materials Science, 23. 135-140 doi:10.1007/bf01174044
Teyssandier, F., Ducarroir, M., Bernard, C. (1981) Determination of the thermodynamic conditions to vapour deposit TixC1−x AT 1800 K. Journal of the Less Common Metals, 78 (2). 269-274 doi:10.1016/0022-5088(81)90136-3
SLIFIRSKI, J., TEYSSANDIER, F. (1993) Titanium carbide and titanium carbonitride obtained by chemical vapor deposition from orgranometallic precursor in the range 450-800°C. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993350
Lartigue, J. F., Ducarroir, M., Armas, B. (1984) Calculation of deposition conditions for Si3N4 from a SiL4-NH3 gas phase (L=H, Cl, Br, CH). Journal of Materials Science, 19. 3079-3089 doi:10.1007/bf01026987
Nadal, M., Teyssandier, F. (1995) Optimization of the Deposition Conditions of Titanium Nitride from Ammonia and Titanium Tetrachloride. Le Journal de Physique IV, 5. doi:10.1051/jphyscol:1995596
Andrieux, M., Badie, J. M., Bisch, C., Ducarroir, M., Teyssandier, F. (1995) Optical Emission Analysis of a Si(CH3)4-Argon Radio Frequency Plasma for SiC Films Deposition. Le Journal de Physique IV, 5. doi:10.1051/jphyscol:1995572
Bisch, C., Nadal, M., Teyssandier, F., Bancel, M., Vallon, B. (1995) Chemical vapour deposition of titanium carbide on WCî—¸Co cemented carbides. Materials Science and Engineering: A, 202. 238-248 doi:10.1016/0921-5093(95)09812-7
Maline, M., Ducarroir, M., Teyssandier, F., Hillel, R., Berjoan, R., Van Loo, F.J.J., Wakelkamp, W. (1993) Auger electron spectroscopy of compounds in the Siî—¸Tiî—¸C system Characterization of Siî—¸Tiî—¸C multiphased materials obtained by CVD. Surface Science Letters, 286 (1). doi:10.1016/0167-2584(93)90618-s
Touanen, Muriel, Teyssandier, Francis, Ducarroir, Michel, Maline, Mohammed, Hillel, Roger, Derep, Jean Luc (1993) Microcomposite and Nanocomposite Structures from Chemical Vapor Deposition in the Silicon-Titanium-Carbon System. Journal of the American Ceramic Society, 76 (6). 1473-1481 doi:10.1111/j.1151-2916.1993.tb03928.x
 
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