von Fieandt, Kristina, Johansson, Fredrik O. L., Balmes, Olivier, Lindblad, Rebecka, Riekehr, Lars, Lindblad, Andreas, Lewin, Erik (2019) In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD. Inorganic Chemistry, 58 (16) 11100-11109 doi:10.1021/acs.inorgchem.9b01631
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD | ||
| Journal | Inorganic Chemistry | ||
| Authors | von Fieandt, Kristina | Author | |
| Johansson, Fredrik O. L. | Author | ||
| Balmes, Olivier | Author | ||
| Lindblad, Rebecka | Author | ||
| Riekehr, Lars | Author | ||
| Lindblad, Andreas | Author | ||
| Lewin, Erik | Author | ||
| Year | 2019 (August 19) | Volume | 58 |
| Issue | 16 | ||
| Publisher | American Chemical Society (ACS) | ||
| DOI | doi:10.1021/acs.inorgchem.9b01631Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 1645401 | Long-form Identifier | mindat:1:5:1645401:1 |
| GUID | 0 | ||
| Full Reference | von Fieandt, Kristina, Johansson, Fredrik O. L., Balmes, Olivier, Lindblad, Rebecka, Riekehr, Lars, Lindblad, Andreas, Lewin, Erik (2019) In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD. Inorganic Chemistry, 58 (16) 11100-11109 doi:10.1021/acs.inorgchem.9b01631 | ||
| Plain Text | von Fieandt, Kristina, Johansson, Fredrik O. L., Balmes, Olivier, Lindblad, Rebecka, Riekehr, Lars, Lindblad, Andreas, Lewin, Erik (2019) In Situ Formation of Ge Nanoparticles by Annealing of Al-Ge-N Thin Films Followed by HAXPES and XRD. Inorganic Chemistry, 58 (16) 11100-11109 doi:10.1021/acs.inorgchem.9b01631 | ||
| In | (2019, August) Inorganic Chemistry Vol. 58 (16) American Chemical Society (ACS) | ||
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