Reference Type | Journal (article/letter/editorial) |
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Title | Electrochemical Deposition of Ni/SiC under Centrifugal Fields |
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Journal | Electrochemistry |
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Authors | MUROTANI, Atsushi | Author |
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FUCHIGAMI, Toshio | Author |
ATOBE, Mahito | Author |
Year | 2008 | Volume | 76 |
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Issue | 11 |
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Publisher | The Electrochemical Society of Japan |
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DOI | doi:10.5796/electrochemistry.76.824Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 16505715 | Long-form Identifier | mindat:1:5:16505715:8 |
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GUID | 0 |
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Full Reference | MUROTANI, Atsushi, FUCHIGAMI, Toshio, ATOBE, Mahito (2008) Electrochemical Deposition of Ni/SiC under Centrifugal Fields. Electrochemistry, 76 (11) 824-826 doi:10.5796/electrochemistry.76.824 |
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Plain Text | MUROTANI, Atsushi, FUCHIGAMI, Toshio, ATOBE, Mahito (2008) Electrochemical Deposition of Ni/SiC under Centrifugal Fields. Electrochemistry, 76 (11) 824-826 doi:10.5796/electrochemistry.76.824 |
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In | (2008) Electrochemistry Vol. 76 (11) The Electrochemical Society of Japan |
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