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Choi, Young-Hwan, Huh, Joo-Youl, Park, Jong-Keuk, Lee, Wook-Seong, Baik, Young-Joon (2023) Comparative Study on Residual Stress of Cubic Boron Nitride Films Deposited Using DC and RF Sputtering Sources. Metals and Materials International, 29 (8) Springer Science and Business Media LLC. 2410-2412 doi:10.1007/s12540-022-01371-w

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Reference TypeJournal (article/letter/editorial)
TitleComparative Study on Residual Stress of Cubic Boron Nitride Films Deposited Using DC and RF Sputtering Sources
JournalMetals and Materials International
AuthorsChoi, Young-HwanAuthor
Huh, Joo-YoulAuthor
Park, Jong-KeukAuthor
Lee, Wook-SeongAuthor
Baik, Young-JoonAuthor
Year2023 (August)Volume29
Issue8
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s12540-022-01371-wSearch in ResearchGate
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Mindat Ref. ID16609519Long-form Identifiermindat:1:5:16609519:7
GUID0
Full ReferenceChoi, Young-Hwan, Huh, Joo-Youl, Park, Jong-Keuk, Lee, Wook-Seong, Baik, Young-Joon (2023) Comparative Study on Residual Stress of Cubic Boron Nitride Films Deposited Using DC and RF Sputtering Sources. Metals and Materials International, 29 (8) Springer Science and Business Media LLC. 2410-2412 doi:10.1007/s12540-022-01371-w
Plain TextChoi, Young-Hwan, Huh, Joo-Youl, Park, Jong-Keuk, Lee, Wook-Seong, Baik, Young-Joon (2023) Comparative Study on Residual Stress of Cubic Boron Nitride Films Deposited Using DC and RF Sputtering Sources. Metals and Materials International, 29 (8) Springer Science and Business Media LLC. 2410-2412 doi:10.1007/s12540-022-01371-w
In(2023, August) Metals and Materials International Vol. 29 (8) Springer Science and Business Media LLC

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Choi, Young-Hwan, Huh, Joo-Youl, Baik, Young-Joon (2023) Oxygen-Induced Residual Stress Reduction of Cubic Boron Nitride Films: Reinterpretation of Ye’s Results Considering Interfacial Turbostratic Boron Nitride Layer. Metals and Materials International, 29 (2) 575-578 doi:10.1007/s12540-022-01235-3
Choi, Young-Hwan, Huh, Joo-Youl, Baik, Young-Joon (2023) Correction: Oxygen-Induced Residual Stress Reduction of Cubic Boron Nitride Films: Reinterpretation of Ye’s Results Considering Interfacial Turbostratic Boron Nitride Layer. Metals and Materials International, 29 (6) 1854 doi:10.1007/s12540-022-01385-4
Ko, Ji-Sun, Park, Jong-Keuk, Lee, Wook-Seong, Huh, Joo-Youl, Baik, Young-Joon (2013) Effect of radio-frequency electric power applied to a boron nitride unbalanced magnetron sputter target on the deposition of cubic boron nitride thin film. Metals and Materials International, 19. 1317-1321 doi:10.1007/s12540-013-6028-5
Lee, Eun-Sook, Park, Jong-Keuk, Lee, Wook-Seong, Seong, Tae-Yeon, Baik, Young-Joon (2013) Effect of deposition temperature on cubic boron nitride thin film deposited by unbalanced magnetron sputtering method with a nanocrystalline diamond buffer layer. Metals and Materials International, 19. 1323-1326 doi:10.1007/s12540-013-6029-4
Choi, Young-Hwan, Huh, Joo-Youl, Baik, Young-Joon (2023) Effect of Ion Flux Variation in DC Magnetron Sputtering on the Deposition of Cubic Boron Nitride Film. Korean Journal of Metals and Materials, 61 (11) 824-829 doi:10.3365/kjmm.2023.61.11.824
Lee, Seung-Min, Seong, Tae-Yeon, Lee, Wook-Seong, Baik, Young-Joon, Park, Jong-Keuk (2013) Growth behavior of cubic boron nitride (cBN) phase in B-C-N film deposited on Si substrate with non-uniform ion flux. Metals and Materials International, 19. 591-595 doi:10.1007/s12540-013-3031-9
Lee, Seung-Min, Seong, Tae-Yeon, Lee, Wook-Seong, Baik, Young-Joon, Park, Jong-Keuk (2013) Erratum to: Growth Behavior of Cubic Boron Nitride (cBN) Phase in B-C-N Film Deposited on Si Substrate with Non-Uniform Ion Flux. Metals and Materials International, 19. 902 doi:10.1007/s12540-013-3036-4
Baik, Young Joon, Bae, Kyung Eun, Park, Jong-Keuk, Lee, Wook-Seong (2016) Oxidation behavior of amorphous boron carbide film deposited using the unbalanced magnetron sputtering method. Korean Journal of Metals and Materials, 54. 8-14 doi:10.3365/kjmm.2016.54.1.08
Baik, Young Joon, Bae, Kyung Eun, Park, Jong Keuk, Lee, Wook Seong (2014) Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method. Korean Journal of Metals and Materials, 52. 969-974 doi:10.3365/kjmm.2014.52.12.969
Baik, Young-Joon, Bae, Kyung-Eun, Chae, Ki-Woong, Park, Jong-Keuk, Lee, Wook-Seong (2015) Silicon carbide thin film deposited by unbalanced magnetron sputtering method. Korean Journal of Metals and Materials, 53. 541-548 doi:10.3365/kjmm.2015.53.8.541
Kim, Hong-Suk, Park, Jong-Keuk, Baik, Young-Joon, Choi, In-Hoon (2003) Origin of residual stress in the formation of boron nitride film by sputtering with Ar ions. Journal of Applied Physics, 94 (5). 3057-3060 doi:10.1063/1.1600527
 
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