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Wang, Shengfei, Rohani, Vandad, Dupont, Paul, Pagnon, Sylvain, Fulcheri, Laurent (2023) A chemical kinetics simulation of plasma-catalytic dry reforming. Chemical Physics, 574. Elsevier BV. 112017 doi:10.1016/j.chemphys.2023.112017

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Reference TypeJournal (article/letter/editorial)
TitleA chemical kinetics simulation of plasma-catalytic dry reforming
JournalChemical Physics
AuthorsWang, ShengfeiAuthor
Rohani, VandadAuthor
Dupont, PaulAuthor
Pagnon, SylvainAuthor
Fulcheri, LaurentAuthor
Year2023 (October)Volume574
PublisherElsevier BV
DOIdoi:10.1016/j.chemphys.2023.112017Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID16647578Long-form Identifiermindat:1:5:16647578:4
GUID0
Full ReferenceWang, Shengfei, Rohani, Vandad, Dupont, Paul, Pagnon, Sylvain, Fulcheri, Laurent (2023) A chemical kinetics simulation of plasma-catalytic dry reforming. Chemical Physics, 574. Elsevier BV. 112017 doi:10.1016/j.chemphys.2023.112017
Plain TextWang, Shengfei, Rohani, Vandad, Dupont, Paul, Pagnon, Sylvain, Fulcheri, Laurent (2023) A chemical kinetics simulation of plasma-catalytic dry reforming. Chemical Physics, 574. Elsevier BV. 112017 doi:10.1016/j.chemphys.2023.112017
In(2023) Chemical Physics Vol. 574. Elsevier BV

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