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Wu, Yuling, Yu, Jingxia, Yang, Liang, Wu, Wei, Wang, Xiangyu, Tang, Min, Li, Bo, Zu, Xiaotao, Xiang, Xia (2023) Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio. Applied Physics B, 129 (11) doi:10.1007/s00340-023-08118-4

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Reference TypeJournal (article/letter/editorial)
TitleModulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio
JournalApplied Physics B
AuthorsWu, YulingAuthor
Yu, JingxiaAuthor
Yang, LiangAuthor
Wu, WeiAuthor
Wang, XiangyuAuthor
Tang, MinAuthor
Li, BoAuthor
Zu, XiaotaoAuthor
Xiang, XiaAuthor
Year2023 (November)Volume129
Issue11
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00340-023-08118-4Search in ResearchGate
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Mindat Ref. ID16880227Long-form Identifiermindat:1:5:16880227:4
GUID0
Full ReferenceWu, Yuling, Yu, Jingxia, Yang, Liang, Wu, Wei, Wang, Xiangyu, Tang, Min, Li, Bo, Zu, Xiaotao, Xiang, Xia (2023) Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio. Applied Physics B, 129 (11) doi:10.1007/s00340-023-08118-4
Plain TextWu, Yuling, Yu, Jingxia, Yang, Liang, Wu, Wei, Wang, Xiangyu, Tang, Min, Li, Bo, Zu, Xiaotao, Xiang, Xia (2023) Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio. Applied Physics B, 129 (11) doi:10.1007/s00340-023-08118-4
In(2023, November) Applied Physics B Vol. 129 (11) Springer Science and Business Media LLC

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