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Lee, Yujin, Seo, Seunggi, Shearer, Alexander B., Werbrouck, Andreas, Kim, Hyungjun, Bent, Stacey F. (2024) HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer. Chemistry of Materials, 36 (9) 4303-4314 doi:10.1021/acs.chemmater.3c03161

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Reference TypeJournal (article/letter/editorial)
TitleHfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer
JournalChemistry of Materials
AuthorsLee, YujinAuthor
Seo, SeunggiAuthor
Shearer, Alexander B.Author
Werbrouck, AndreasAuthor
Kim, HyungjunAuthor
Bent, Stacey F.Author
Year2024 (May 14)Volume36
Issue9
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acs.chemmater.3c03161Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID17388071Long-form Identifiermindat:1:5:17388071:7
GUID0
Full ReferenceLee, Yujin, Seo, Seunggi, Shearer, Alexander B., Werbrouck, Andreas, Kim, Hyungjun, Bent, Stacey F. (2024) HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer. Chemistry of Materials, 36 (9) 4303-4314 doi:10.1021/acs.chemmater.3c03161
Plain TextLee, Yujin, Seo, Seunggi, Shearer, Alexander B., Werbrouck, Andreas, Kim, Hyungjun, Bent, Stacey F. (2024) HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer. Chemistry of Materials, 36 (9) 4303-4314 doi:10.1021/acs.chemmater.3c03161
In(2024, May) Chemistry of Materials Vol. 36 (9) American Chemical Society (ACS)

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Lee, Yujin, Rothman, Amnon, Shearer, Alexander B., Bent, Stacey F. (2025) Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and Precursors. Chemistry of Materials, 37 (5). doi:10.1021/acs.chemmater.4c02902
Shearer, Alexander, Pieck, Fabian, Yarbrough, Josiah, Werbrouck, Andreas, Tonner-Zech, Ralf, Bent, Stacey F. (2025) Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition. Chemistry of Materials, 37 (1). doi:10.1021/acs.chemmater.4c02231
Yarbrough, Josiah, Pieck, Fabian, Shearer, Alexander B., Maue, Patrick, Tonner-Zech, Ralf, Bent, Stacey F. (2023) Area-Selective Atomic Layer Deposition of Al2O3 with a Methanesulfonic Acid Inhibitor. Chemistry of Materials, 35 (15) 5963-5974 doi:10.1021/acs.chemmater.3c00904
Rothman, Amnon, Werbrouck, Andreas, Bent, Stacey F. (2024) Enhanced Growth in Atomic Layer Deposition of Ruthenium Metal: The Role of Surface Diffusion and Nucleation Sites. Chemistry of Materials, 36 (1) 541-550 doi:10.1021/acs.chemmater.3c02663
Lewis, Jacqueline, Shi, Jingwei, Werbrouck, Andreas, Bent, Stacey F. (2025) Deposition and Degradation Mechanism of Zinc Thiolate Thin Films via Hybrid Molecular Layer Deposition. Chemistry of Materials, 37 (4). doi:10.1021/acs.chemmater.4c02571
Lee, Yujin, Kim, Kangsik, Lee, Zonghoon, Lee, Hong-Sub, Lee, Han-Bo-Ram, Kim, Woo-Hee, Oh, Il-Kwon, Kim, Hyungjun (2024) Correction to “Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films”. Chemistry of Materials, 36 (1) 609 doi:10.1021/acs.chemmater.3c02586
Lee, Sanghun, Seo, Seunggi, Kim, Tae Hyun, Yoon, Hwi, Park, Seonyeong, Na, Seunggyu, Seo, Jeongwoo, Kim, Soo-Hyun, Chung, Seung-min, Kim, Hyungjun (2025) Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films. The Journal of Chemical Physics, 162 (12). doi:10.1063/5.0257779
Liu, Tzu-Ling, Bent, Stacey F. (2021) Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns. Chemistry of Materials, 33 (2) 513-523 doi:10.1021/acs.chemmater.0c03227
Yoon, Hwi, Lee, Yujin, Lee, Ga Yeon, Seo, Seunggi, Park, Bo Keun, Chung, Taek-Mo, Oh, Il-Kwon, Kim, Hyungjun (2024) Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition. The Journal of Chemical Physics, 160 (2) doi:10.1063/5.0182690
Shi, Jingwei, Seo, Seunggi, Schuster, Nathaniel J., Kim, Hyungjun, Bent, Stacey F. (2022) Ionic Liquid-Mediated Route to Atomic Layer Deposition of Tin(II) Oxide via a C–C Bond Cleavage Ligand Modification Mechanism. Journal of the American Chemical Society, 144 (47) 21772-21782 doi:10.1021/jacs.2c10257
Lee, Yujin, Seo, Seunggi, Oh, Il-Kwon, Lee, Sanghun, Kim, Hyungjun (2019) Effects of O2 plasma treatment on moisture barrier properties of SiO2 grown by plasma-enhanced atomic layer deposition. Ceramics International, 45. 17662-17668 doi:10.1016/j.ceramint.2019.05.332
 
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