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Lee, Dowwook; Jeon, Hyeongtag (2025) Effect of precursor Pre-Treatment of tin monosulfide thin film using atomic layer deposition. Applied Surface Science, 704. doi:10.1016/j.apsusc.2025.163415

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Reference TypeJournal (article/letter/editorial)
TitleEffect of precursor Pre-Treatment of tin monosulfide thin film using atomic layer deposition
JournalApplied Surface Science
AuthorsLee, DowwookAuthor
Jeon, HyeongtagAuthor
Year2025 (September)Volume704
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2025.163415Search in ResearchGate
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Mindat Ref. ID18403733Long-form Identifiermindat:1:5:18403733:9
GUID0
Full ReferenceLee, Dowwook; Jeon, Hyeongtag (2025) Effect of precursor Pre-Treatment of tin monosulfide thin film using atomic layer deposition. Applied Surface Science, 704. doi:10.1016/j.apsusc.2025.163415
Plain TextLee, Dowwook; Jeon, Hyeongtag (2025) Effect of precursor Pre-Treatment of tin monosulfide thin film using atomic layer deposition. Applied Surface Science, 704. doi:10.1016/j.apsusc.2025.163415
In(2025) Applied Surface Science Vol. 704. Elsevier BV

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Cho, Seungchan, Lee, Keunwoo, Song, Pungkeun, Jeon, Hyeongtag, Kim, Yangdo (2007) Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor. Japanese Journal of Applied Physics, 46 (7) 4085-4088 doi:10.1143/jjap.46.4085
Lee, Hak-Joo, Jeon, Hyeongtag, Lee, Wook-Seong (2011) Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column. Journal of Applied Physics, 109 (2). 23303pp. doi:10.1063/1.3533764
 
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