Du, Liyong, Chu, Wenxiang, Miao, Hongyan, Wang, Dawei, Xu, Chongying, Ding, Yuqiang (2015) Synthesis, Characterization, and Thermal Properties of Chlorine-Containing 1,1,2,2-Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films. European Journal of Inorganic Chemistry, 2015 (19) 3205-3211 doi:10.1002/ejic.201500493
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Synthesis, Characterization, and Thermal Properties of Chlorine-Containing 1,1,2,2-Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films | ||
Journal | European Journal of Inorganic Chemistry | ||
Authors | Du, Liyong | Author | |
Chu, Wenxiang | Author | ||
Miao, Hongyan | Author | ||
Wang, Dawei | Author | ||
Xu, Chongying | Author | ||
Ding, Yuqiang | Author | ||
Year | 2015 (July) | Volume | 2015 |
Issue | 19 | ||
Publisher | Wiley | ||
DOI | doi:10.1002/ejic.201500493Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 2776864 | Long-form Identifier | mindat:1:5:2776864:6 |
GUID | 0 | ||
Full Reference | Du, Liyong, Chu, Wenxiang, Miao, Hongyan, Wang, Dawei, Xu, Chongying, Ding, Yuqiang (2015) Synthesis, Characterization, and Thermal Properties of Chlorine-Containing 1,1,2,2-Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films. European Journal of Inorganic Chemistry, 2015 (19) 3205-3211 doi:10.1002/ejic.201500493 | ||
Plain Text | Du, Liyong, Chu, Wenxiang, Miao, Hongyan, Wang, Dawei, Xu, Chongying, Ding, Yuqiang (2015) Synthesis, Characterization, and Thermal Properties of Chlorine-Containing 1,1,2,2-Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films. European Journal of Inorganic Chemistry, 2015 (19) 3205-3211 doi:10.1002/ejic.201500493 | ||
In | (2015, July) European Journal of Inorganic Chemistry Vol. 2015 (19) Wiley |
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