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Wang, C.A., Patnaik, S., Caunt, J.W., Brown, R.A. (1988) Growth characteristics of a vertical rotating-disk OMVPE reactor. Journal of Crystal Growth, 93 (1). 228-234 doi:10.1016/0022-0248(88)90532-5

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Reference TypeJournal (article/letter/editorial)
TitleGrowth characteristics of a vertical rotating-disk OMVPE reactor
JournalJournal of Crystal Growth
AuthorsWang, C.A.Author
Patnaik, S.Author
Caunt, J.W.Author
Brown, R.A.Author
Year1988Volume93
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0022-0248(88)90532-5Search in ResearchGate
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Mindat Ref. ID2783602Long-form Identifiermindat:1:5:2783602:6
GUID0
Full ReferenceWang, C.A., Patnaik, S., Caunt, J.W., Brown, R.A. (1988) Growth characteristics of a vertical rotating-disk OMVPE reactor. Journal of Crystal Growth, 93 (1). 228-234 doi:10.1016/0022-0248(88)90532-5
Plain TextWang, C.A., Patnaik, S., Caunt, J.W., Brown, R.A. (1988) Growth characteristics of a vertical rotating-disk OMVPE reactor. Journal of Crystal Growth, 93 (1). 228-234 doi:10.1016/0022-0248(88)90532-5
In(1988) Journal of Crystal Growth Vol. 93 (1) Elsevier BV

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Patnaik, S., Brown, R.A., Wang, C.A. (1989) Hydrodynamic dispersion in rotating-disk omvpe reactors: Numerical simulation and experimental measurements. Journal of Crystal Growth, 96 (1). 153-174 doi:10.1016/0022-0248(89)90285-6
Krueger, C.W., Patnaik, S., Wang, C.A., Flytzani-Stephanopoulos, M. (1996) CH3I vapor etching of GaAs in a vertical rotating-disk reactor. Journal of Crystal Growth, 169 (1). 51-60 doi:10.1016/0022-0248(96)00278-3
Groves, S.H., Palmateer, S.C., Caunt, J.W., Hovey, D.L. (1988) New reactor design for growth of InP and related alloys. Journal of Crystal Growth, 93 (1). 242-247 doi:10.1016/0022-0248(88)90534-9
Wang, C.A., Groves, S.H., Palmateer, S.C., Weyburne, D.W., Brown, R.A. (1986) Flow visualization studies for optimization of OMVPE reactor design. Journal of Crystal Growth, 77 (1). 136-143 doi:10.1016/0022-0248(86)90293-9
Palmateer, S.C., Groves, S.H., Wang, C.A., Weyburne, D.W., Brown, R.A. (1987) Use of flow visualization and tracer gas studies for designing an InP/InGaAsP OMVPE reactor. Journal of Crystal Growth, 83 (2). 202-210 doi:10.1016/0022-0248(87)90009-1
Tompa, G.S., McKee, M.A., Beckham, C., Zawadzki, P.A., Colabella, J.M., Reinert, P.D., Capuder, K., Stall, R.A., Norris, P.E. (1988) A parametric investigation of GaAs epitaxial growth uniformity in a high speed, rotating-disk MOCVD reactor. Journal of Crystal Growth, 93 (1). 220-227 doi:10.1016/0022-0248(88)90531-3
Woelk, E., Beneking, H. (1988) A novel MOVPE reactor with a rotating substrate. Journal of Crystal Growth, 93 (1). 216-219 doi:10.1016/0022-0248(88)90530-1
McKee, M.A., Yoo, B.-S., Stall, R.A. (1992) Uniform growth of InSb on GaAs in a rotating disk reactor by LP-MOVPE. Journal of Crystal Growth, 124 (1). 286-291 doi:10.1016/0022-0248(92)90473-v
Biber, Catharina R., Wang, Christine A., Motakef, Shahryar (1992) Flow regime map and deposition rate uniformity in vertical rotating-disk OMVPE reactors. Journal of Crystal Growth, 123 (3). 545-554 doi:10.1016/0022-0248(92)90616-q
Frijlink, P.M. (1988) A new versatile, large size MOVPE reactor. Journal of Crystal Growth, 93 (1). 207-215 doi:10.1016/0022-0248(88)90529-5
Parsons, J.D. (1992) Inverted-vertical OMVPE reactor: design and characterization. Journal of Crystal Growth, 116 (3). 387-396 doi:10.1016/0022-0248(92)90648-3
 
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