Tarala, V., Ambartsumov, M., Altakhov, A., Martens, V., Shevchenko, M. (2016) Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures. Journal of Crystal Growth, 455. 157-160 doi:10.1016/j.jcrysgro.2016.10.015
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures | ||
Journal | Journal of Crystal Growth | ||
Authors | Tarala, V. | Author | |
Ambartsumov, M. | Author | ||
Altakhov, A. | Author | ||
Martens, V. | Author | ||
Shevchenko, M. | Author | ||
Year | 2016 (December) | Volume | 455 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.jcrysgro.2016.10.015Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 2912558 | Long-form Identifier | mindat:1:5:2912558:0 |
GUID | 0 | ||
Full Reference | Tarala, V., Ambartsumov, M., Altakhov, A., Martens, V., Shevchenko, M. (2016) Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures. Journal of Crystal Growth, 455. 157-160 doi:10.1016/j.jcrysgro.2016.10.015 | ||
Plain Text | Tarala, V., Ambartsumov, M., Altakhov, A., Martens, V., Shevchenko, M. (2016) Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures. Journal of Crystal Growth, 455. 157-160 doi:10.1016/j.jcrysgro.2016.10.015 | ||
In | (2016) Journal of Crystal Growth Vol. 455. Elsevier BV |
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