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Trempa, M., Sturm, F., Kranert, C., Schwanke, S., Reimann, C., Friedrich, J., Schenk, C. (2020) Impact of different SiO2 diffusion barrier layers on lifetime distribution in multi-crystalline silicon ingots. Journal of Crystal Growth, 532. 125378pp. doi:10.1016/j.jcrysgro.2019.125378

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Reference TypeJournal (article/letter/editorial)
TitleImpact of different SiO2 diffusion barrier layers on lifetime distribution in multi-crystalline silicon ingots
JournalJournal of Crystal Growth
AuthorsTrempa, M.Author
Sturm, F.Author
Kranert, C.Author
Schwanke, S.Author
Reimann, C.Author
Friedrich, J.Author
Schenk, C.Author
Year2020 (February)Volume532
PublisherElsevier BV
DOIdoi:10.1016/j.jcrysgro.2019.125378Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID2918384Long-form Identifiermindat:1:5:2918384:9
GUID0
Full ReferenceTrempa, M., Sturm, F., Kranert, C., Schwanke, S., Reimann, C., Friedrich, J., Schenk, C. (2020) Impact of different SiO2 diffusion barrier layers on lifetime distribution in multi-crystalline silicon ingots. Journal of Crystal Growth, 532. 125378pp. doi:10.1016/j.jcrysgro.2019.125378
Plain TextTrempa, M., Sturm, F., Kranert, C., Schwanke, S., Reimann, C., Friedrich, J., Schenk, C. (2020) Impact of different SiO2 diffusion barrier layers on lifetime distribution in multi-crystalline silicon ingots. Journal of Crystal Growth, 532. 125378pp. doi:10.1016/j.jcrysgro.2019.125378
In(2020) Journal of Crystal Growth Vol. 532. Elsevier BV

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Trempa, M., Kranert, C., Reimann, C., Friedrich, J. (2021) Impact of silicon feedstock contamination by gas phase diffusion on material quality of cast silicon ingots. Journal of Crystal Growth, 570. 126224pp. doi:10.1016/j.jcrysgro.2021.126224
Kupka, I., Lehmann, T., Trempa, M., Kranert, C., Reimann, C., Friedrich, J. (2017) Influence of different nucleation layers on the initial grain structure of multicrystalline silicon ingots. Journal of Crystal Growth, 465. 18-26 doi:10.1016/j.jcrysgro.2017.02.039
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