Horino, Y. (1998) Positive and negative low-energy ion beam deposition apparatus and applications. Materials Chemistry and Physics, 54. 224-228 doi:10.1016/s0254-0584(98)00078-9
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Positive and negative low-energy ion beam deposition apparatus and applications | ||
Journal | Materials Chemistry and Physics | ||
Authors | Horino, Y. | Author | |
Year | 1998 (July) | Volume | 54 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/s0254-0584(98)00078-9Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 3051387 | Long-form Identifier | mindat:1:5:3051387:9 |
GUID | 0 | ||
Full Reference | Horino, Y. (1998) Positive and negative low-energy ion beam deposition apparatus and applications. Materials Chemistry and Physics, 54. 224-228 doi:10.1016/s0254-0584(98)00078-9 | ||
Plain Text | Horino, Y. (1998) Positive and negative low-energy ion beam deposition apparatus and applications. Materials Chemistry and Physics, 54. 224-228 doi:10.1016/s0254-0584(98)00078-9 | ||
In | (1998, July) Materials Chemistry and Physics Vol. 54 (1) Elsevier BV |
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