Sheppard, L.R., Zhang, H., Liu, R., Macartney, S., Murphy, T., Wainer, P., Wuhrer, R. (2019) Reactive sputtered TixNbyN coatings. II. Effect of common deposition parameters. Materials Chemistry and Physics, 224. 320-327 doi:10.1016/j.matchemphys.2018.12.046
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Reactive sputtered TixNbyN coatings. II. Effect of common deposition parameters | ||
| Journal | Materials Chemistry and Physics | ||
| Authors | Sheppard, L.R. | Author | |
| Zhang, H. | Author | ||
| Liu, R. | Author | ||
| Macartney, S. | Author | ||
| Murphy, T. | Author | ||
| Wainer, P. | Author | ||
| Wuhrer, R. | Author | ||
| Year | 2019 (February) | Volume | 224 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.matchemphys.2018.12.046Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 3065172 | Long-form Identifier | mindat:1:5:3065172:6 |
| GUID | 0 | ||
| Full Reference | Sheppard, L.R., Zhang, H., Liu, R., Macartney, S., Murphy, T., Wainer, P., Wuhrer, R. (2019) Reactive sputtered TixNbyN coatings. II. Effect of common deposition parameters. Materials Chemistry and Physics, 224. 320-327 doi:10.1016/j.matchemphys.2018.12.046 | ||
| Plain Text | Sheppard, L.R., Zhang, H., Liu, R., Macartney, S., Murphy, T., Wainer, P., Wuhrer, R. (2019) Reactive sputtered TixNbyN coatings. II. Effect of common deposition parameters. Materials Chemistry and Physics, 224. 320-327 doi:10.1016/j.matchemphys.2018.12.046 | ||
| In | (2019) Materials Chemistry and Physics Vol. 224. Elsevier BV | ||
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