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Chen, Wenhao, Zhang, Hong, Wang, Ying, Ma, Zhiyuan, Li, Zhicheng (2014) In-situ Microstructural Investigations by Electron-beam Irradiation Induced Crystallization of Amorphous MoOx Thin Films with High Performance for Li-ion Storage. Electrochimica Acta, 144. 369-375 doi:10.1016/j.electacta.2014.08.071

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Reference TypeJournal (article/letter/editorial)
TitleIn-situ Microstructural Investigations by Electron-beam Irradiation Induced Crystallization of Amorphous MoOx Thin Films with High Performance for Li-ion Storage
JournalElectrochimica Acta
AuthorsChen, WenhaoAuthor
Zhang, HongAuthor
Wang, YingAuthor
Ma, ZhiyuanAuthor
Li, ZhichengAuthor
Year2014 (October)Volume144
PublisherElsevier BV
DOIdoi:10.1016/j.electacta.2014.08.071Search in ResearchGate
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Mindat Ref. ID3204186Long-form Identifiermindat:1:5:3204186:2
GUID0
Full ReferenceChen, Wenhao, Zhang, Hong, Wang, Ying, Ma, Zhiyuan, Li, Zhicheng (2014) In-situ Microstructural Investigations by Electron-beam Irradiation Induced Crystallization of Amorphous MoOx Thin Films with High Performance for Li-ion Storage. Electrochimica Acta, 144. 369-375 doi:10.1016/j.electacta.2014.08.071
Plain TextChen, Wenhao, Zhang, Hong, Wang, Ying, Ma, Zhiyuan, Li, Zhicheng (2014) In-situ Microstructural Investigations by Electron-beam Irradiation Induced Crystallization of Amorphous MoOx Thin Films with High Performance for Li-ion Storage. Electrochimica Acta, 144. 369-375 doi:10.1016/j.electacta.2014.08.071
In(2014) Electrochimica Acta Vol. 144. Elsevier BV

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