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Steinert, M., Acker, J., Wetzig, K. (2008) New Aspects on the Reduction of Nitric Acid during Wet Chemical Etching of Silicon in Concentrated HF/HNO3 Mixtures. The Journal of Physical Chemistry C, 112 (36). 14139-14144 doi:10.1021/jp801937z

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Reference TypeJournal (article/letter/editorial)
TitleNew Aspects on the Reduction of Nitric Acid during Wet Chemical Etching of Silicon in Concentrated HF/HNO3 Mixtures
JournalThe Journal of Physical Chemistry C
AuthorsSteinert, M.Author
Acker, J.Author
Wetzig, K.Author
Year2008 (September 11)Volume112
Issue36
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/jp801937zSearch in ResearchGate
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Mindat Ref. ID3896360Long-form Identifiermindat:1:5:3896360:9
GUID0
Full ReferenceSteinert, M., Acker, J., Wetzig, K. (2008) New Aspects on the Reduction of Nitric Acid during Wet Chemical Etching of Silicon in Concentrated HF/HNO3 Mixtures. The Journal of Physical Chemistry C, 112 (36). 14139-14144 doi:10.1021/jp801937z
Plain TextSteinert, M., Acker, J., Wetzig, K. (2008) New Aspects on the Reduction of Nitric Acid during Wet Chemical Etching of Silicon in Concentrated HF/HNO3 Mixtures. The Journal of Physical Chemistry C, 112 (36). 14139-14144 doi:10.1021/jp801937z
In(2008, September) The Journal of Physical Chemistry C Vol. 112 (36) American Chemical Society (ACS)

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Steinert, M., Acker, J., Oswald, S., Wetzig, K. (2007) Study on the Mechanism of Silicon Etching in HNO3-Rich HF/HNO3Mixtures. The Journal of Physical Chemistry C, 111 (5). 2133-2140 doi:10.1021/jp066348j
Steinert, M., Acker, J., Henßge, A., Wetzig, K. (2005) Experimental Studies on the Mechanism of Wet Chemical Etching of Silicon in HF∕HNO[sub 3] Mixtures. Journal of the Electrochemical Society, 152. doi:10.1149/1.2116727
Acker, Jörg, Rietig, Anja, Steinert, Marco, Hoffmann, Volker (2012) Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO3 Mixtures. The Journal of Physical Chemistry C, 116 (38). 20380-20388 doi:10.1021/jp305621h
Steinert, Marco, Acker, Jörg, Krause, Matthias, Oswald, Steffen, Wetzig, Klaus (2006) Reactive Species Generated during Wet Chemical Etching of Silicon in HF/HNO3Mixtures. The Journal of Physical Chemistry B, 110 (23). 11377-11382 doi:10.1021/jp0608168
Rietig, Anja, Acker, Jörg (2023) Kinetic studies on acidic wet chemical etching of silicon in binary and ternary mixtures of HF, HNO3 and H2SiF6. Physical Chemistry Chemical Physics, 25 (38) 26245-26257 doi:10.1039/d3cp03188h
Rietig, Anja, Langner, Thomas, Acker, Jörg (2022) Comprehensive stoichiometric studies on the reaction of silicon in HF/HNO3 and HF/HNO3/H2SiF6 mixtures. Physical Chemistry Chemical Physics, 24 (5) 3094-3108 doi:10.1039/d1cp05418j
Rietig, Anja, Langner, Thomas, Acker, Jörg (2019) A revised model of silicon oxidation during the dissolution of silicon in HF/HNO3 mixtures. Physical Chemistry Chemical Physics, 21 (39). 22002-22013 doi:10.1039/c9cp04429a
Yamamura, Kazuya, Mitani, Takuro (2008) Etching characteristics of local wet etching of silicon in HF/HNO3 mixtures. Surface and Interface Analysis, 40 (6). 1011-1013 doi:10.1002/sia.2838
Henßge, Antje, Acker, Jörg, Müller, Constanze (2006) Titrimetric determination of silicon dissolved in concentrated HF–HNO3-etching solutions. Talanta, 68 (3). 581-585 doi:10.1016/j.talanta.2005.04.049
Rietig, Anja, Langner, Thomas, Acker, Jörg (2023) About determining reliable etching rates and the role of temperature in kinetic experiments on acidic wet chemical etching of silicon. Physical Chemistry Chemical Physics, 25 (16) 11387-11397 doi:10.1039/d2cp05837e
Hoffmann, Volker, Steinert, Marco, Acker, Jörg (2011) Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry (DC-GD-OES). Journal of Analytical Atomic Spectrometry, 26 (10). 1990pp. doi:10.1039/c1ja10033e
 
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