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Wang, F., van Halem, D., van der Hoek, J.P. (2016) The fate of H2O2 during managed aquifer recharge: A residual from advanced oxidation processes for drinking water production. Chemosphere, 148. 263-269 doi:10.1016/j.chemosphere.2016.01.046

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Reference TypeJournal (article/letter/editorial)
TitleThe fate of H2O2 during managed aquifer recharge: A residual from advanced oxidation processes for drinking water production
JournalChemosphere
AuthorsWang, F.Author
van Halem, D.Author
van der Hoek, J.P.Author
Year2016 (April)Volume148
PublisherElsevier BV
DOIdoi:10.1016/j.chemosphere.2016.01.046Search in ResearchGate
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Mindat Ref. ID3994768Long-form Identifiermindat:1:5:3994768:0
GUID0
Full ReferenceWang, F., van Halem, D., van der Hoek, J.P. (2016) The fate of H2O2 during managed aquifer recharge: A residual from advanced oxidation processes for drinking water production. Chemosphere, 148. 263-269 doi:10.1016/j.chemosphere.2016.01.046
Plain TextWang, F., van Halem, D., van der Hoek, J.P. (2016) The fate of H2O2 during managed aquifer recharge: A residual from advanced oxidation processes for drinking water production. Chemosphere, 148. 263-269 doi:10.1016/j.chemosphere.2016.01.046
In(2016) Chemosphere Vol. 148. Elsevier BV

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