Reference Type | Journal (article/letter/editorial) |
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Title | Robust topological nodal lines in halide carbides |
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Journal | Physical Chemistry Chemical Physics |
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Authors | Pham, Anh | Author |
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Klose, Frank | Author |
Li, Sean | Author |
Year | 2019 | Volume | 21 |
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Issue | 36 |
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Publisher | Royal Society of Chemistry (RSC) |
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DOI | doi:10.1039/c9cp04330fSearch in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 4037750 | Long-form Identifier | mindat:1:5:4037750:4 |
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GUID | 0 |
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Full Reference | Pham, Anh, Klose, Frank, Li, Sean (2019) Robust topological nodal lines in halide carbides. Physical Chemistry Chemical Physics, 21 (36). 20262-20268 doi:10.1039/c9cp04330f |
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Plain Text | Pham, Anh, Klose, Frank, Li, Sean (2019) Robust topological nodal lines in halide carbides. Physical Chemistry Chemical Physics, 21 (36). 20262-20268 doi:10.1039/c9cp04330f |
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In | (2019) Physical Chemistry Chemical Physics Vol. 21 (36) Royal Society of Chemistry (RSC) |
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