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Jung, Keun, Choi, Won-Kook, Yoon, Seok-Jin, Kim, Hyun Jae, Choi, Ji-Won (2012) Influence of substrate temperature on the electrical and optical properties of Ga-doped ZnO thin films fabricated by continuous composition spread. Ceramics International, 38. doi:10.1016/j.ceramint.2011.05.107

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of substrate temperature on the electrical and optical properties of Ga-doped ZnO thin films fabricated by continuous composition spread
JournalCeramics International
AuthorsJung, KeunAuthor
Choi, Won-KookAuthor
Yoon, Seok-JinAuthor
Kim, Hyun JaeAuthor
Choi, Ji-WonAuthor
Year2012 (January)Volume38
PublisherElsevier BV
DOIdoi:10.1016/j.ceramint.2011.05.107Search in ResearchGate
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Mindat Ref. ID4202298Long-form Identifiermindat:1:5:4202298:1
GUID0
Full ReferenceJung, Keun, Choi, Won-Kook, Yoon, Seok-Jin, Kim, Hyun Jae, Choi, Ji-Won (2012) Influence of substrate temperature on the electrical and optical properties of Ga-doped ZnO thin films fabricated by continuous composition spread. Ceramics International, 38. doi:10.1016/j.ceramint.2011.05.107
Plain TextJung, Keun, Choi, Won-Kook, Yoon, Seok-Jin, Kim, Hyun Jae, Choi, Ji-Won (2012) Influence of substrate temperature on the electrical and optical properties of Ga-doped ZnO thin films fabricated by continuous composition spread. Ceramics International, 38. doi:10.1016/j.ceramint.2011.05.107
In(2012) Ceramics International Vol. 38. Elsevier BV

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Choi, Ji-Won, Jung, Keun, Shin, Dong Wook, Yoon, Seok-Jin, Choi, Won-Kook, Song, Jong-Han, Kim, Hyun Jae (2010) Electrical and Optical Properties of Al-doped Zinc-oxide Thin Films Deposited at Room Temperature by Using the Continuous Composition Spread Method. Journal of the Korean Physical Society, 57 (4). 1092-1095 doi:10.3938/jkps.57.1092
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Cho, Jung, Nah, Jongbum, Oh, Min-Seok, Song, Jae-Hoon, Yoon, Ki-Hyun, Jung, Hyung-Jin, Choi, Won-Kook (2001) Enhancement of Photoluminescence and Electrical Properties of Ga-Doped ZnO Thin Film Grown on α-Al2O3(0001) Single-Crystal Substrate by rf Magnetron Sputtering through Rapid Thermal Annealing. Japanese Journal of Applied Physics, 40. doi:10.1143/jjap.40.l1040
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