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Mameli, Alfredo, Karasulu, Bora, Verheijen, Marcel A., Barcones, Beatriz, Macco, Bart, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M. Erwin, Roozeboom, Fred (2019) Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition. Chemistry of Materials, 31. 1250-1257 doi:10.1021/acs.chemmater.8b03165

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Reference TypeJournal (article/letter/editorial)
TitleArea-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition
JournalChemistry of Materials
AuthorsMameli, AlfredoAuthor
Karasulu, BoraAuthor
Verheijen, Marcel A.Author
Barcones, BeatrizAuthor
Macco, BartAuthor
Mackus, Adriaan J. M.Author
Kessels, Wilhelmus M. M. ErwinAuthor
Roozeboom, FredAuthor
Year2019 (February 26)Volume31
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acs.chemmater.8b03165Search in ResearchGate
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Mindat Ref. ID4313356Long-form Identifiermindat:1:5:4313356:7
GUID0
Full ReferenceMameli, Alfredo, Karasulu, Bora, Verheijen, Marcel A., Barcones, Beatriz, Macco, Bart, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M. Erwin, Roozeboom, Fred (2019) Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition. Chemistry of Materials, 31. 1250-1257 doi:10.1021/acs.chemmater.8b03165
Plain TextMameli, Alfredo, Karasulu, Bora, Verheijen, Marcel A., Barcones, Beatriz, Macco, Bart, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M. Erwin, Roozeboom, Fred (2019) Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition. Chemistry of Materials, 31. 1250-1257 doi:10.1021/acs.chemmater.8b03165
In(2019) Chemistry of Materials Vol. 31. American Chemical Society (ACS)

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Mameli, Alfredo, Kuang, Yinghuan, Aghaee, Morteza, Ande, Chaitanya K., Karasulu, Bora, Creatore, Mariadriana, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M., Roozeboom, Fred (2017) Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation. Chemistry of Materials, 29. 921-925 doi:10.1021/acs.chemmater.6b04469
Vos, Martijn F. J., Chopra, Sonali N., Verheijen, Marcel A., Ekerdt, John G., Agarwal, Sumit, Kessels, Wilhelmus M. M., Mackus, Adriaan J. M. (2019) Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching. Chemistry of Materials, 31. 3878-3882 doi:10.1021/acs.chemmater.9b00193
Merkx, Marc J. M., Vlaanderen, Sander, Faraz, Tahsin, Verheijen, Marcel A., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M. (2020) Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity. Chemistry of Materials, 32 (18) 7788-7795 doi:10.1021/acs.chemmater.0c02370
Mackus, Adriaan J. M., Merkx, Marc J. M., Kessels, Wilhelmus M. M. (2019) From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity. Chemistry of Materials, 31. 2-12 doi:10.1021/acs.chemmater.8b03454
Vervuurt, René H. J., Karasulu, Bora, Verheijen, Marcel A., Kessels, Wilhelmus (Erwin) M. M., Bol, Ageeth A. (2017) Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization. Chemistry of Materials, 29. 2090-2100 doi:10.1021/acs.chemmater.6b04368
Macco, Bart, Verheijen, Marcel A., Black, Lachlan E., Barcones, Beatriz, Melskens, J., Kessels, Wilhelmus M. M. (2016) On the solid phase crystallization of In2O3:H transparent conductive oxide films prepared by atomic layer deposition. Journal of Applied Physics, 120 (8). 85314pp. doi:10.1063/1.4962008
Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A., Macco, Bart, Prosa, Ty J., Larson, David J., Roozeboom, Fred, Kessels, Wilhelmus M. M. (2018) Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography. Chemistry of Materials, 30. 1209-1217 doi:10.1021/acs.chemmater.7b03501
Weber, Matthieu J., Mackus, Adriaan J. M., Verheijen, Marcel A., van der Marel, Cees, Kessels, Wilhelmus M. M. (2012) Supported Core/Shell Bimetallic Nanoparticles Synthesis by Atomic Layer Deposition. Chemistry of Materials, 24. 2973-2977 doi:10.1021/cm301206e
Merkx, Marc J. M., Sandoval, Tania E., Hausmann, Dennis M., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M. (2020) Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2. Chemistry of Materials, 32 (8) 3335-3345 doi:10.1021/acs.chemmater.9b02992
Wu, Yizhi, Macco, Bart, Vanhemel, Dries, Kölling, Sebastian, Verheijen, Marcel A., Koenraad, Paul M., Kessels, Wilhelmus M. M., Roozeboom, Fred (2017) Atomic Layer Deposition of In2O3:H from InCp and H2O/O2: Microstructure and Isotope Labeling Studies. ACS Applied Materials & Interfaces, 9. 592-601 doi:10.1021/acsami.6b13560
Janssen, Thijs, Vossen, Lodewijk J. P., Verheijen, Marcel A., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M. (2025) Topographically selective atomic layer deposition within trenches enabled by an amorphous carbon inhibition layer. Applied Physics Letters, 126 (6). doi:10.1063/5.0246311
 
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