Baek, Seunghwa, Kang, Gumin, Kang, Min, Lee, Chang-Won, Kim, Kyoungsik (2016) Resolution enhancement using plasmonic metamask for wafer-scale photolithography in the far field. Scientific Reports, 6. doi:10.1038/srep30476
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Resolution enhancement using plasmonic metamask for wafer-scale photolithography in the far field | ||
Journal | Scientific Reports | ||
Authors | Baek, Seunghwa | Author | |
Kang, Gumin | Author | ||
Kang, Min | Author | ||
Lee, Chang-Won | Author | ||
Kim, Kyoungsik | Author | ||
Year | 2016 (July) | Volume | 6 |
Publisher | Springer Science and Business Media LLC | ||
DOI | doi:10.1038/srep30476Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 4652332 | Long-form Identifier | mindat:1:5:4652332:7 |
GUID | 0 | ||
Full Reference | Baek, Seunghwa, Kang, Gumin, Kang, Min, Lee, Chang-Won, Kim, Kyoungsik (2016) Resolution enhancement using plasmonic metamask for wafer-scale photolithography in the far field. Scientific Reports, 6. doi:10.1038/srep30476 | ||
Plain Text | Baek, Seunghwa, Kang, Gumin, Kang, Min, Lee, Chang-Won, Kim, Kyoungsik (2016) Resolution enhancement using plasmonic metamask for wafer-scale photolithography in the far field. Scientific Reports, 6. doi:10.1038/srep30476 | ||
In | (2016) Scientific Reports Vol. 6. Springer Science and Business Media LLC |
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