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Echigoya, J., Asano, W., Yamaguchi, A. (2002) Microstructure of Sputtered CoFe2O4 Film. physica status solidi (a), 191 (2). 359-369 doi:10.1002/1521-396x(200206)191:2<359::aid-pssa359>3.0.co;2-1

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Reference TypeJournal (article/letter/editorial)
TitleMicrostructure of Sputtered CoFe2O4 Film
Journalphysica status solidi (a)
AuthorsEchigoya, J.Author
Asano, W.Author
Yamaguchi, A.Author
Year2002 (June)Volume191
Issue2
PublisherWiley
DOIdoi:10.1002/1521-396x(200206)191:2<359::aid-pssa359>3.0.co;2-1Search in ResearchGate
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Mindat Ref. ID5087991Long-form Identifiermindat:1:5:5087991:3
GUID0
Full ReferenceEchigoya, J., Asano, W., Yamaguchi, A. (2002) Microstructure of Sputtered CoFe2O4 Film. physica status solidi (a), 191 (2). 359-369 doi:10.1002/1521-396x(200206)191:2<359::aid-pssa359>3.0.co;2-1
Plain TextEchigoya, J., Asano, W., Yamaguchi, A. (2002) Microstructure of Sputtered CoFe2O4 Film. physica status solidi (a), 191 (2). 359-369 doi:10.1002/1521-396x(200206)191:23.0.co;2-1
In(2002, June) physica status solidi (a) Vol. 191 (2) Wiley

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Echigoya, J., Asano, W., Yamaguchi, A. (2002) Microstructure of Sputtered CoFe2O4 Film. physica status solidi (a), 191 (2). 357 doi:10.1002/1521-396x(200206)191:2<357::aid-pssa357>3.0.co;2-9
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