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Kang, T. D., Lee, Hosun, Park, S. J., Jang, J., Lee, Soonil (2002) Microcrystalline silicon thin films studied using spectroscopic ellipsometry. Journal of Applied Physics, 92 (5). 2467-2474 doi:10.1063/1.1499980

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Reference TypeJournal (article/letter/editorial)
TitleMicrocrystalline silicon thin films studied using spectroscopic ellipsometry
JournalJournal of Applied Physics
AuthorsKang, T. D.Author
Lee, HosunAuthor
Park, S. J.Author
Jang, J.Author
Lee, SoonilAuthor
Year2002 (September)Volume92
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.1499980Search in ResearchGate
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Mindat Ref. ID5116569Long-form Identifiermindat:1:5:5116569:5
GUID0
Full ReferenceKang, T. D., Lee, Hosun, Park, S. J., Jang, J., Lee, Soonil (2002) Microcrystalline silicon thin films studied using spectroscopic ellipsometry. Journal of Applied Physics, 92 (5). 2467-2474 doi:10.1063/1.1499980
Plain TextKang, T. D., Lee, Hosun, Park, S. J., Jang, J., Lee, Soonil (2002) Microcrystalline silicon thin films studied using spectroscopic ellipsometry. Journal of Applied Physics, 92 (5). 2467-2474 doi:10.1063/1.1499980
In(2002, September) Journal of Applied Physics Vol. 92 (5) AIP Publishing

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