Wang, Biao, Woo, C. H. (2003) Stability of 180° domain in ferroelectric thin films. Journal of Applied Physics, 94 (1). 610-617 doi:10.1063/1.1578529
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Stability of 180° domain in ferroelectric thin films | ||
Journal | Journal of Applied Physics | ||
Authors | Wang, Biao | Author | |
Woo, C. H. | Author | ||
Year | 2003 (July) | Volume | 94 |
Issue | 1 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.1578529Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5121520 | Long-form Identifier | mindat:1:5:5121520:0 |
GUID | 0 | ||
Full Reference | Wang, Biao, Woo, C. H. (2003) Stability of 180° domain in ferroelectric thin films. Journal of Applied Physics, 94 (1). 610-617 doi:10.1063/1.1578529 | ||
Plain Text | Wang, Biao, Woo, C. H. (2003) Stability of 180° domain in ferroelectric thin films. Journal of Applied Physics, 94 (1). 610-617 doi:10.1063/1.1578529 | ||
In | (2003, July) Journal of Applied Physics Vol. 94 (1) AIP Publishing |
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