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Natarajan, Gomathi, Daniels, S., Cameron, D. C., O’Reilly, L., Mitra, A., McNally, P. J., Lucas, O. F., Rajendra Kumar, R. T., Reid, Ian, Bradley, A. L. (2006) Growth of CuCl thin films by magnetron sputtering for ultraviolet optoelectronic applications. Journal of Applied Physics, 100 (3). 33520pp. doi:10.1063/1.2227261

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Reference TypeJournal (article/letter/editorial)
TitleGrowth of CuCl thin films by magnetron sputtering for ultraviolet optoelectronic applications
JournalJournal of Applied Physics
AuthorsNatarajan, GomathiAuthor
Daniels, S.Author
Cameron, D. C.Author
O’Reilly, L.Author
Mitra, A.Author
McNally, P. J.Author
Lucas, O. F.Author
Rajendra Kumar, R. T.Author
Reid, IanAuthor
Bradley, A. L.Author
Year2006 (August)Volume100
Issue3
PublisherAIP Publishing
DOIdoi:10.1063/1.2227261Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5143114Long-form Identifiermindat:1:5:5143114:5
GUID0
Full ReferenceNatarajan, Gomathi, Daniels, S., Cameron, D. C., O’Reilly, L., Mitra, A., McNally, P. J., Lucas, O. F., Rajendra Kumar, R. T., Reid, Ian, Bradley, A. L. (2006) Growth of CuCl thin films by magnetron sputtering for ultraviolet optoelectronic applications. Journal of Applied Physics, 100 (3). 33520pp. doi:10.1063/1.2227261
Plain TextNatarajan, Gomathi, Daniels, S., Cameron, D. C., O’Reilly, L., Mitra, A., McNally, P. J., Lucas, O. F., Rajendra Kumar, R. T., Reid, Ian, Bradley, A. L. (2006) Growth of CuCl thin films by magnetron sputtering for ultraviolet optoelectronic applications. Journal of Applied Physics, 100 (3). 33520pp. doi:10.1063/1.2227261
In(2006, August) Journal of Applied Physics Vol. 100 (3) AIP Publishing

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Natarajan, Gomathi, Rajendra Kumar, R. T., Daniels, S., Cameron, D. C., McNally, P. J. (2006) Stoichiometry control of sputtered CuCl thin films: Influence on ultraviolet emission properties. Journal of Applied Physics, 100 (9). 96108pp. doi:10.1063/1.2364665
O’Reilly, L., Lucas, O. F., McNally, P. J., Reader, A., Natarajan, Gomathi, Daniels, S., Cameron, D. C., Mitra, A., Martinez-Rosas, M., Bradley, A. L. (2005) Room-temperature ultraviolet luminescence from γ-CuCl grown on near lattice-matched silicon. Journal of Applied Physics, 98 (11). 113512pp. doi:10.1063/1.2138799
O’Reilly, L., Mitra, A., Natarajan, Gomathi, Lucas, O.F., McNally, P.J., Daniels, S., Cameron, D.C., Bradley, A.L., Reader, A. (2006) Impact on structural, optical and electrical properties of CuCl by incorporation of Zn for n-type doping. Journal of Crystal Growth, 287 (1). 139-144 doi:10.1016/j.jcrysgro.2005.10.057
Mitra, Anirban, O'Reilly, L., Lucas, O. F., Natarajan, Gomathi, Danieluk, D., Bradley, A. L., McNally, P. J., Daniels, S., Cameron, D. C., Reader, A., Martinez-Rosas, M. (2008) Optical properties of CuCl films on silicon substrates. physica status solidi (b), 245 (12). 2808-2814 doi:10.1002/pssb.200844021
Lucas, F O, Mitra, A, McNally, P J, Daniels, S, Bradley, A L, Taylor, D M, Proskuryakov, Y Y, Durose, K, Cameron, D C (2007) Evaluation of the chemical, electronic and optoelectronic properties of γ-CuCl thin films and their fabrication on Si substrates. Journal of Physics D: Applied Physics, 40. 3461-3467 doi:10.1088/0022-3727/40/11/030
Lucas, F.O., O’Reilly, L., Natarajan, G., McNally, P.J., Daniels, S., Taylor, D.M., William, S., Cameron, D.C., Bradley, A.L., Miltra, A. (2006) Encapsulation of the heteroepitaxial growth of wide band gap γ-CuCl on silicon substrates. Journal of Crystal Growth, 287 (1). 112-117 doi:10.1016/j.jcrysgro.2005.10.053
Alam, M M, Lucas, F Olabanji, Danieluk, D, Bradley, A L, Rajani, K V, Daniels, S, McNally, P J (2009) Hybrid organic–inorganic spin-on-glass CuCl films for optoelectronic applications. Journal of Physics D: Applied Physics, 42. 225307pp. doi:10.1088/0022-3727/42/22/225307
Lucas, F. Olabanji, McNally, P. J., Cowley, A., Daniels, S., Bradley, L., Danieluk, D., Taylor, D. M. (2009) Structural, optical and electrical properties of Co-evaporated CuCl/KCl films. physica status solidi (c), 6. doi:10.1002/pssc.200881310
Valcheva, E., Birch, J., Persson, P. O. Å., Tungasmita, S., Hultman, L. (2006) Epitaxial growth and orientation of AlN thin films on Si(001) substrates deposited by reactive magnetron sputtering. Journal of Applied Physics, 100 (12). 123514pp. doi:10.1063/1.2402971
Leng, W. J., Yang, C. R., Ji, H., Zhang, J. H., Tang, J. L., Chen, H. W., Gao, L. F. (2006) Electrical and optical properties of lanthanum-modified lead zirconate titanate thin films by radio-frequency magnetron sputtering. Journal of Applied Physics, 100 (10). 106102pp. doi:10.1063/1.2390542
Prater, W. L., Allen, E. L., Lee, W.-Y., Toney, M. F., Kellock, A., Daniels, J. S., Hedstrom, J. A., Harrell, T. (2005) Microstructural comparisons of ultrathin Cu films deposited by ion-beam and dc-magnetron sputtering. Journal of Applied Physics, 97 (9). 93301pp. doi:10.1063/1.1886275
 
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