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Ohmi, Hiromasa, Kakiuchi, Hiroaki, Hamaoka, Yoshinori, Yasutake, Kiyoshi (2007) Silicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma. Journal of Applied Physics, 102 (2). 23302pp. doi:10.1063/1.2753675

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Reference TypeJournal (article/letter/editorial)
TitleSilicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma
JournalJournal of Applied Physics
AuthorsOhmi, HiromasaAuthor
Kakiuchi, HiroakiAuthor
Hamaoka, YoshinoriAuthor
Yasutake, KiyoshiAuthor
Year2007 (July 15)Volume102
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.2753675Search in ResearchGate
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Mindat Ref. ID5150418Long-form Identifiermindat:1:5:5150418:6
GUID0
Full ReferenceOhmi, Hiromasa, Kakiuchi, Hiroaki, Hamaoka, Yoshinori, Yasutake, Kiyoshi (2007) Silicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma. Journal of Applied Physics, 102 (2). 23302pp. doi:10.1063/1.2753675
Plain TextOhmi, Hiromasa, Kakiuchi, Hiroaki, Hamaoka, Yoshinori, Yasutake, Kiyoshi (2007) Silicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma. Journal of Applied Physics, 102 (2). 23302pp. doi:10.1063/1.2753675
In(2007, July) Journal of Applied Physics Vol. 102 (2) AIP Publishing

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Ohmi, Hiromasa, Goto, Akihiro, Kamada, Daiki, Hamaoka, Yoshinori, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2009) Purified Si film formation from metallurgical-grade Si by hydrogen plasma induced chemical transport. Applied Physics Letters, 95 (18). 181506pp. doi:10.1063/1.3261751
Ohmi, Hiromasa, Yasutake, Kiyoshi, Hamaoka, Yoshinori, Kakiuchi, Hiroaki (2007) Metal induced hydrogen effusion from amorphous silicon. Applied Physics Letters, 91 (24). 241901pp. doi:10.1063/1.2819086
Ohmi, Hiromasa, Yamada, Takahiro, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2011) Purified Silicon Film Formation from Metallurgical-Grade Silicon by Hydrogen-Plasma-Induced Chemical Transport. Japanese Journal of Applied Physics, 50 (8) 8 doi:10.1143/jjap.50.08jd01
Ohmi, Hiromasa, Yamada, Takahiro, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2011) Purified Silicon Film Formation from Metallurgical-Grade Silicon by Hydrogen-Plasma-Induced Chemical Transport. Japanese Journal of Applied Physics, 50 (8) 8 doi:10.7567/jjap.50.08jd01
Ohmi, Hiromasa, Sato, Jumpei, Hirano, Tatsuya, Kubota, Yusuke, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2016) Copper dry etching by sub-atmospheric-pressure pure hydrogen glow plasma. Applied Physics Letters, 109 (21). 211603pp. doi:10.1063/1.4967382
Kakiuchi, Hiroaki, Ohmi, Hiromasa, Yasutake, Kiyoshi (2021) Gas-phase kinetics in atmospheric-pressure plasma-enhanced chemical vapor deposition of silicon films. Journal of Applied Physics, 130 (5) 53307pp. doi:10.1063/5.0057951
Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2015) Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma. Journal of Applied Physics, 118 (4). 45301pp. doi:10.1063/1.4926849
Kakiuchi, Hiroaki, Ohmi, Hiromasa, Harada, Makoto, Watanabe, Heiji, Yasutake, Kiyoshi (2007) Highly efficient oxidation of silicon at low temperatures using atmospheric pressure plasma. Applied Physics Letters, 90 (9). 91909pp. doi:10.1063/1.2710190
Yoshida, Kazushi, Ohmi, Hiromasa, Yasutake, Kiyoshi, Kakiuchi, Hiroaki (2021) Formation of indium nitride nanostructures by atmospheric pressure plasma nitridation of molten indium. Journal of Applied Physics, 130 (6) 63301pp. doi:10.1063/5.0055532
Ohmi, Hiromasa, Kishimoto, Kazuya, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2008) Impacts of noble gas dilution on Si film structure prepared by atmospheric-pressure plasma enhanced chemical transport. Journal of Physics D: Applied Physics, 41. 195208pp. doi:10.1088/0022-3727/41/19/195208
Ohmi, Hiromasa, Hori, Takahiro, Mori, Tetsuya, Kakiuchi, Hiroaki, Yasutake, Kiyoshi (2011) Low-temperature synthesis of microcrystalline 3C-SiC film by high-pressure hydrogen-plasma-enhanced chemical transport. Journal of Physics D: Applied Physics, 44. 235202pp. doi:10.1088/0022-3727/44/23/235202
 
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