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Sridhara, Karthik, Borowik, Łukasz, Mariolle, Denis, Chevalier, Nicolas, Colonna, Jean-Philippe (2012) Environment and baking influence on charge retention on silicon nitride charge trap layers. Journal of Applied Physics, 111 (2). 23710pp. doi:10.1063/1.3678455

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Reference TypeJournal (article/letter/editorial)
TitleEnvironment and baking influence on charge retention on silicon nitride charge trap layers
JournalJournal of Applied Physics
AuthorsSridhara, KarthikAuthor
Borowik, ŁukaszAuthor
Mariolle, DenisAuthor
Chevalier, NicolasAuthor
Colonna, Jean-PhilippeAuthor
Year2012 (January 15)Volume111
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.3678455Search in ResearchGate
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Mindat Ref. ID5187890Long-form Identifiermindat:1:5:5187890:2
GUID0
Full ReferenceSridhara, Karthik, Borowik, Łukasz, Mariolle, Denis, Chevalier, Nicolas, Colonna, Jean-Philippe (2012) Environment and baking influence on charge retention on silicon nitride charge trap layers. Journal of Applied Physics, 111 (2). 23710pp. doi:10.1063/1.3678455
Plain TextSridhara, Karthik, Borowik, Łukasz, Mariolle, Denis, Chevalier, Nicolas, Colonna, Jean-Philippe (2012) Environment and baking influence on charge retention on silicon nitride charge trap layers. Journal of Applied Physics, 111 (2). 23710pp. doi:10.1063/1.3678455
In(2012, January) Journal of Applied Physics Vol. 111 (2) AIP Publishing

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