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Geyer, Scott M., Methaapanon, Rungthiwa, Johnson, Richard, Brennan, Sean, Toney, Mike F., Clemens, Bruce, Bent, Stacey (2014) Structural evolution of platinum thin films grown by atomic layer deposition. Journal of Applied Physics, 116 (6). 64905pp. doi:10.1063/1.4892104

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Reference TypeJournal (article/letter/editorial)
TitleStructural evolution of platinum thin films grown by atomic layer deposition
JournalJournal of Applied Physics
AuthorsGeyer, Scott M.Author
Methaapanon, RungthiwaAuthor
Johnson, RichardAuthor
Brennan, SeanAuthor
Toney, Mike F.Author
Clemens, BruceAuthor
Bent, StaceyAuthor
Year2014 (August 14)Volume116
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.4892104Search in ResearchGate
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Mindat Ref. ID5200160Long-form Identifiermindat:1:5:5200160:4
GUID0
Full ReferenceGeyer, Scott M., Methaapanon, Rungthiwa, Johnson, Richard, Brennan, Sean, Toney, Mike F., Clemens, Bruce, Bent, Stacey (2014) Structural evolution of platinum thin films grown by atomic layer deposition. Journal of Applied Physics, 116 (6). 64905pp. doi:10.1063/1.4892104
Plain TextGeyer, Scott M., Methaapanon, Rungthiwa, Johnson, Richard, Brennan, Sean, Toney, Mike F., Clemens, Bruce, Bent, Stacey (2014) Structural evolution of platinum thin films grown by atomic layer deposition. Journal of Applied Physics, 116 (6). 64905pp. doi:10.1063/1.4892104
In(2014, August) Journal of Applied Physics Vol. 116 (6) AIP Publishing

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Methaapanon, Rungthiwa, Geyer, Scott M., Brennan, Sean, Bent, Stacey F. (2013) Size Dependent Effects in Nucleation of Ru and Ru Oxide Thin Films by Atomic Layer Deposition Measured by Synchrotron Radiation X-ray Diffraction. Chemistry of Materials, 25. 3458-3463 doi:10.1021/cm401585k
Geyer, Scott M., Methaapanon, Rungthiwa, Johnson, Richard W., Kim, Woo-Hee, Van Campen, Douglas G., Metha, Apurva, Bent, Stacey F. (2014) An atomic layer deposition chamber for in situ x-ray diffraction and scattering analysis. Review of Scientific Instruments, 85 (5). 55116pp. doi:10.1063/1.4876484
Geyer, Scott M., Methaapanon, Rungthiwa, Shong, Bonggeun, Pianetta, Piero A., Bent, Stacey F. (2013) In Vacuo Photoemission Studies of Platinum Atomic Layer Deposition Using Synchrotron Radiation. The Journal of Physical Chemistry Letters, 4 (1). 176-179 doi:10.1021/jz301475z
Methaapanon, Rungthiwa, Geyer, Scott M., Lee, Han-Bo-Ram, Bent, Stacey F. (2012) The low temperature atomic layer deposition of ruthenium and the effect of oxygen exposure. Journal of Materials Chemistry, 22. 25154pp. doi:10.1039/c2jm35332f
Methaapanon, Rungthiwa, Bent, Stacey F. (2010) Comparative Study of Titanium Dioxide Atomic Layer Deposition on Silicon Dioxide and Hydrogen-Terminated Silicon. The Journal of Physical Chemistry C, 114 (23). 10498-10504 doi:10.1021/jp1013303
Methaapanon, R., Geyer, S. M., Hagglund, C., Pianetta, P. A., Bent, S. F. (2013) Portable atomic layer deposition reactor for in situ synchrotron photoemission studies. Review of Scientific Instruments, 84 (1). 15104pp. doi:10.1063/1.4773230
Lee, Han-Bo-Ram, Mullings, Marja N., Jiang, Xirong, Clemens, Bruce M., Bent, Stacey F. (2012) Nucleation-Controlled Growth of Nanoparticles by Atomic Layer Deposition. Chemistry of Materials, 24. 4051-4059 doi:10.1021/cm3014978
Bergsman, David S., Closser, Richard G., Tassone, Christopher J., Clemens, Bruce M., Nordlund, Dennis, Bent, Stacey F. (2017) Effect of Backbone Chemistry on the Structure of Polyurea Films Deposited by Molecular Layer Deposition. Chemistry of Materials, 29. 1192-1203 doi:10.1021/acs.chemmater.6b04530
Wangperawong, Artit, Hsu, Po-Chun, Yee, Yesheng, Herron, Steven M., Clemens, Bruce M., Cui, Yi, Bent, Stacey F. (2014) Bifacial solar cell with SnS absorber by vapor transport deposition. Applied Physics Letters, 105 (17). 173904pp. doi:10.1063/1.4898092
Toney, Michael F., Brennan, Sean (1989) Measurements of carbon thin films using x‐ray reflectivity. Journal of Applied Physics, 66 (4). 1861-1863 doi:10.1063/1.344361
Toney, Michael F., Brennan, Sean (1989) Structural depth profiling of iron oxide thin films using grazing incidence asymmetric Bragg x‐ray diffraction. Journal of Applied Physics, 65 (12). 4763-4768 doi:10.1063/1.343230
 
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