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Emelyanov, O. A., Ivanov, I. O. (2014) Fast electromigration crack in nanoscale aluminum film. Journal of Applied Physics, 116 (6). 64309pp. doi:10.1063/1.4892676

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Reference TypeJournal (article/letter/editorial)
TitleFast electromigration crack in nanoscale aluminum film
JournalJournal of Applied Physics
AuthorsEmelyanov, O. A.Author
Ivanov, I. O.Author
Year2014 (August 14)Volume116
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.4892676Search in ResearchGate
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Mindat Ref. ID5200190Long-form Identifiermindat:1:5:5200190:5
GUID0
Full ReferenceEmelyanov, O. A., Ivanov, I. O. (2014) Fast electromigration crack in nanoscale aluminum film. Journal of Applied Physics, 116 (6). 64309pp. doi:10.1063/1.4892676
Plain TextEmelyanov, O. A., Ivanov, I. O. (2014) Fast electromigration crack in nanoscale aluminum film. Journal of Applied Physics, 116 (6). 64309pp. doi:10.1063/1.4892676
In(2014, August) Journal of Applied Physics Vol. 116 (6) AIP Publishing

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Attardo, M. J., Rosenberg, R. (1970) Electromigration Damage in Aluminum Film Conductors. Journal of Applied Physics, 41 (6). 2381-2386 doi:10.1063/1.1659233
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Blech, I. A. (1976) Electromigration in thin aluminum films on titanium nitride. Journal of Applied Physics, 47 (4). 1203-1208 doi:10.1063/1.322842
Poehler, T. O., Abraham, David (1965) ALUMINUMā€DOPED CdSe THIN FILM TRIODES. Applied Physics Letters, 6 (7). 125-126 doi:10.1063/1.1754197
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