Jeong, Yesul, Pearson, Christopher, Lee, Yong Uk, Ahn, Kyun, Cho, Chae-Ryong, Hwang, Jaeeun, Kim, Hongdoo, Do, Lee-Mi, Petty, Michael C. (2014) Effects of hydrogen plasma treatment on the electrical behavior of solution-processed ZnO transistors. Journal of Applied Physics, 116 (7). 74509pp. doi:10.1063/1.4893470
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Effects of hydrogen plasma treatment on the electrical behavior of solution-processed ZnO transistors | ||
| Journal | Journal of Applied Physics | ||
| Authors | Jeong, Yesul | Author | |
| Pearson, Christopher | Author | ||
| Lee, Yong Uk | Author | ||
| Ahn, Kyun | Author | ||
| Cho, Chae-Ryong | Author | ||
| Hwang, Jaeeun | Author | ||
| Kim, Hongdoo | Author | ||
| Do, Lee-Mi | Author | ||
| Petty, Michael C. | Author | ||
| Year | 2014 (August 21) | Volume | 116 |
| Issue | 7 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.4893470Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5200277 | Long-form Identifier | mindat:1:5:5200277:3 |
| GUID | 0 | ||
| Full Reference | Jeong, Yesul, Pearson, Christopher, Lee, Yong Uk, Ahn, Kyun, Cho, Chae-Ryong, Hwang, Jaeeun, Kim, Hongdoo, Do, Lee-Mi, Petty, Michael C. (2014) Effects of hydrogen plasma treatment on the electrical behavior of solution-processed ZnO transistors. Journal of Applied Physics, 116 (7). 74509pp. doi:10.1063/1.4893470 | ||
| Plain Text | Jeong, Yesul, Pearson, Christopher, Lee, Yong Uk, Ahn, Kyun, Cho, Chae-Ryong, Hwang, Jaeeun, Kim, Hongdoo, Do, Lee-Mi, Petty, Michael C. (2014) Effects of hydrogen plasma treatment on the electrical behavior of solution-processed ZnO transistors. Journal of Applied Physics, 116 (7). 74509pp. doi:10.1063/1.4893470 | ||
| In | (2014, August) Journal of Applied Physics Vol. 116 (7) AIP Publishing | ||
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