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Mikhelashvili, V., Cristea, D., Meyler, B., Yofis, S., Shneider, Y., Atiya, G., Cohen-Hyams, T., Kauffmann, Y., Kaplan, W. D., Eisenstein, G. (2014) A highly sensitive broadband planar metal-oxide-semiconductor photo detector fabricated on a silicon-on-insulator substrate. Journal of Applied Physics, 116 (7). 74513pp. doi:10.1063/1.4893582

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Reference TypeJournal (article/letter/editorial)
TitleA highly sensitive broadband planar metal-oxide-semiconductor photo detector fabricated on a silicon-on-insulator substrate
JournalJournal of Applied Physics
AuthorsMikhelashvili, V.Author
Cristea, D.Author
Meyler, B.Author
Yofis, S.Author
Shneider, Y.Author
Atiya, G.Author
Cohen-Hyams, T.Author
Kauffmann, Y.Author
Kaplan, W. D.Author
Eisenstein, G.Author
Year2014 (August 21)Volume116
Issue7
PublisherAIP Publishing
DOIdoi:10.1063/1.4893582Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5200292Long-form Identifiermindat:1:5:5200292:2
GUID0
Full ReferenceMikhelashvili, V., Cristea, D., Meyler, B., Yofis, S., Shneider, Y., Atiya, G., Cohen-Hyams, T., Kauffmann, Y., Kaplan, W. D., Eisenstein, G. (2014) A highly sensitive broadband planar metal-oxide-semiconductor photo detector fabricated on a silicon-on-insulator substrate. Journal of Applied Physics, 116 (7). 74513pp. doi:10.1063/1.4893582
Plain TextMikhelashvili, V., Cristea, D., Meyler, B., Yofis, S., Shneider, Y., Atiya, G., Cohen-Hyams, T., Kauffmann, Y., Kaplan, W. D., Eisenstein, G. (2014) A highly sensitive broadband planar metal-oxide-semiconductor photo detector fabricated on a silicon-on-insulator substrate. Journal of Applied Physics, 116 (7). 74513pp. doi:10.1063/1.4893582
In(2014, August) Journal of Applied Physics Vol. 116 (7) AIP Publishing

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