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Rond, C., Hamann, S., Wartel, M., Lombardi, G., Gicquel, A., Röpcke, J. (2014) Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power. Journal of Applied Physics, 116 (9). 93301pp. doi:10.1063/1.4894778

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Reference TypeJournal (article/letter/editorial)
TitleInfrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power
JournalJournal of Applied Physics
AuthorsRond, C.Author
Hamann, S.Author
Wartel, M.Author
Lombardi, G.Author
Gicquel, A.Author
Röpcke, J.Author
Year2014 (September 7)Volume116
Issue9
PublisherAIP Publishing
DOIdoi:10.1063/1.4894778Search in ResearchGate
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Mindat Ref. ID5200448Long-form Identifiermindat:1:5:5200448:9
GUID0
Full ReferenceRond, C., Hamann, S., Wartel, M., Lombardi, G., Gicquel, A., Röpcke, J. (2014) Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power. Journal of Applied Physics, 116 (9). 93301pp. doi:10.1063/1.4894778
Plain TextRond, C., Hamann, S., Wartel, M., Lombardi, G., Gicquel, A., Röpcke, J. (2014) Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power. Journal of Applied Physics, 116 (9). 93301pp. doi:10.1063/1.4894778
In(2014, September) Journal of Applied Physics Vol. 116 (9) AIP Publishing

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Lombardi, G., Hassouni, K., Bénédic, F., Mohasseb, F., Röpcke, J., Gicquel, A. (2004) Spectroscopic diagnostics and modeling of Ar∕H2∕CH4 microwave discharges used for nanocrystalline diamond deposition. Journal of Applied Physics, 96 (11). 6739-6751 doi:10.1063/1.1814174
Lombardi, G., Hassouni, K., Stancu, G.-D., Mechold, L., Röpcke, J., Gicquel, A. (2005) Modeling of microwave discharges of H2 admixed with CH4 for diamond deposition. Journal of Applied Physics, 98 (5). 53303pp. doi:10.1063/1.2034646
Derkaoui, N., Rond, C., Hassouni, K., Gicquel, A. (2014) Spectroscopic analysis of H2/CH4microwave plasma and fast growth rate of diamond single crystal. Journal of Applied Physics, 115 (23). 233301pp. doi:10.1063/1.4883955
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Dekkar, D, Puth, A, Bisceglia, E, Moreira, P W P, Pipa, A V, Lombardi, G, Röpcke, J, van Helden, J H, Bénédic, F (2020) Effect of the admixture of N2 to low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films. Journal of Physics D: Applied Physics, 53 (45) 455204pp. doi:10.1088/1361-6463/aba7df
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